Production of 70-nm Cr dots by laser-induced forward transfer

被引：15
|
作者：
Sametoglu, Vahit [1 ,3 ]
Sauer, Vincent T. K. [1 ,2 ]
Tsui, Ying Y. [1 ]
机构：
[1] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada
[2] Natl Inst Nanotechnol, Edmonton, AB T6G 2M9, Canada
[3] Univ British Columbia, Dept Chem, Vancouver, BC V6T 1Z1, Canada
来源：
OPTICS EXPRESS | 2013年 / 21卷 / 15期
基金：
加拿大自然科学与工程研究理事会;
关键词：
METAL-DEPOSITION; FILMS; FABRICATION;
D O I：
10.1364/OE.21.018525
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The effect of donor film thickness and laser beam fluence on the size of laser-induced forward transfer (LIFT) spots is studied to achieve sub-100 nm features. A 130 fs, 800 nm laser is focused on ultrathin Cr films, and the transfer and ablation thresholds of these films at various thicknesses are determined. The minimum transfer spot size decreases with decreasing donor film thickness and incident laser fluence. Minimum LIFT spots of 70-450 nm diameter are obtained from films of 20-80 nm thickness, respectively. The 70 nm diameter transfer spots obtained from sputtered continuous films are the smallest to date. (C)2013 Optical Society of America
引用
收藏
页码：18525 / 18531
页数：7
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