On the enhancement of pervaporation properties of plasma-deposited hybrid silica membranes

被引：6

作者：

Ngamou, Patrick H. T. ^{[1
]}

Overbeek, Johan P. ^{[2
]}

van Veen, Henk M. ^{[2
]}

Vente, Jaap F. ^{[2
]}

Cuperus, Petrus F. ^{[3
]}

Creatore, Mariadriana ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

[2] Energy Res Ctr Netherlands, ECN, NL-1755 ZG Petten, Netherlands

[3] SolSep BV, NL-7333 NW Apeldoorn, Netherlands

来源：

RSC ADVANCES | 2013年 / 3卷 / 34期

关键词：

EXPANDING THERMAL PLASMA; POLYSILSESQUIOXANE XEROGELS; CHEMICAL-CHARACTERIZATION; INORGANIC MEMBRANES; DEHYDRATION; PERFORMANCE; SEPARATION;

D O I：

10.1039/c3ra41799a

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The separation performance of a polymeric-supported hybrid silica membrane in the dehydration process of a butanol-water mixture at 95 degrees C has been enhanced by applying a bias to the substrate during the plasma deposition.

引用

页码：14241 / 14244

页数：4

共 50 条

[31] CHARACTERIZATION OF PLASMA-DEPOSITED SILICON DIOXIDE
ADAMS, AC
ALEXANDER, FB
CAPIO, CD
SMITH, TE
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (07) : 1545 - 1551
[32] EFFECTS OF IMPURITIES ON ELECTRONIC PROPERTIES OF PLASMA-DEPOSITED AMORPHOUS SILICON ALLOYS
GRIFFITH, RW
KAMPAS, FJ
VANIER, PE
JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 709 - 709
[33] Electrical Properties of Plasma-Deposited Silicon Oxide Clarified by Chemical Modeling
Kovalgin, A. Y.
Boogaard, A.
Brunets, I.
Aarnink, A. A. I.
Wolters, R. A. M.
EUROCVD 17 / CVD 17, 2009, 25 (08): : 23 - 32
[34] On the hardening effect of plasma-deposited coatings
Rutkovskii, A.V.
Lyashenko, B.A.
Gopkalo, A.P.
Soroka, E.B.
Strength of Materials, 1999, 31 (06): : 616 - 618
[35] DIAMOND ABRASION PROPERTIES OF PLASMA-DEPOSITED SILICON-OXIDE FILMS
KAGANOWICZ, G
WEAR, 1986, 112 (01) : 29 - 37
[36] CORRELATION OF CHEMICAL AND ELECTRICAL-PROPERTIES OF PLASMA-DEPOSITED TETRAMETHYLSILANE FILMS
SZETO, R
HESS, DW
JOURNAL OF APPLIED PHYSICS, 1981, 52 (02) : 903 - 908
[37] ELECTROPHYSICAL PROPERTIES OF PLASMA-DEPOSITED REFRACTORY OXIDES UNDER REACTOR IRRADIATION
IVANOV, VM
KALININ, GM
KUZOVITKIN, VF
SKLIZKOV, SP
MARKINA, NV
SARKSYAN, VV
SKOBELEVA, VA
INORGANIC MATERIALS, 1981, 17 (09) : 1203 - 1207
[38] ELECTRICAL-PROPERTIES OF PLASMA-DEPOSITED FLUORINATED SILICON-NITRIDE
LIVENGOOD, RE
HESS, DW
THIN SOLID FILMS, 1988, 162 (1-2) : 59 - 65
[39] Plasma-deposited membranes for controlled release of antibiotic to prevent bacterial adhesion and biofilm formation
Hendricks, SK
Kwok, C
Shen, MC
Horbett, TA
Ratner, BD
Bryers, JD
JOURNAL OF BIOMEDICAL MATERIALS RESEARCH, 2000, 50 (02): : 160 - 170
[40] ELECTRICAL AND OPTICAL-PROPERTIES OF PLASMA-DEPOSITED AMORPHOUS HYDROCARBON FILMS
ROHWER, K
HAMMER, P
THIELE, JU
GISSLER, W
BLAUDECK, P
FRAUENHEIM, T
MEISSNER, D
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 843 - 846

← 1 2 3 4 5 →