Research and development of high performance soft magnetic thin films

被引:4
|
作者
Osaka, T
Momma, T
Yokoshima, T
机构
[1] Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
[2] Waseda Univ, Kagami Mem Lab Mat Sci & Technol, Shinjuku Ku, Tokyo 1698555, Japan
关键词
electrodeposition; soft magnetic film; high B-s film; high rho film;
D O I
10.5796/electrochemistry.67.894
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (B-s) and low coercivity. Magnetic properties except for B-s and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (rho) on the base of this high B-s CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.
引用
收藏
页码:894 / 899
页数:6
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