The reaction mechanism of poly [4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene]

被引：0
|
作者：
Yamamoto, Hiroki [1 ]
Kozawa, Takahiro [1 ]
Okamoto, Kazumasa [1 ]
Tagawa, Seiichi [1 ]
Ando, Tomoyuki [2 ]
Sato, Mitsuru [2 ]
Komano, Hiroji [2 ]
机构：
[1] Osaka Univ, Inst Sci & Ind Res, 8-1 Mihogaoka, Osaka 5670047, Japan
[2] Tokyo Ohka Kogyo Co Ltd, Koza, Kanagawa 2530114, Japan
来源：
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2 | 2006年 / 6153卷
关键词：
chemically amplified resists; acid generation; electron beam; halogenation; Coumarin6;
D O I：
10.1117/12.656262
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
It is a well-known strategy for the improvement of resist performance to halogenate resist materials especially in electron beam and X-ray resists. However, the halogenation of polymers requires special caution for chemically amplified resists, because it may interfere with acid generation. In this work, the acid generation in poly[4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] films was investigated. Acid yields decrease as the ratio of hexafluoroalcohol units increases. This study showed that the reactivity of the polymers with low energy electrons (similar to 0eV) correlates to the decrease of acid yields.
引用
收藏
页码：U1390 / U1398
页数：9
相关论文
共 50 条
  • [1] A new photoresist materials for 157nm lithography-3:: poly[2-hydroxy-3-pinanyl vinyl sulfonate-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)styrene]
    Iimori, H
    Ando, S
    Shibasaki, Y
    Ueda, M
    Kishimura, S
    Endo, M
    Sasago, M
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2003, 16 (04) : 601 - 605
  • [2] New photoresist materials for 157-nm lithography.: Poly[vinylsulfonyl fluoride-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] partially protected with tert-butoxycarbonyl
    Fujigaya, T
    Sibasaki, Y
    Ando, S
    Kishimura, S
    Endo, M
    Sasago, M
    Ueda, M
    CHEMISTRY OF MATERIALS, 2003, 15 (07) : 1512 - 1517
  • [3] 1,1,1,3,3,3-Hexafluoro-2-(4-nitrophenyl)-N-phenylisopropylamine
    Pavkovic, SF
    Nelson, DW
    Owens, JR
    ACTA CRYSTALLOGRAPHICA SECTION E-STRUCTURE REPORTS ONLINE, 2001, 57 : o941 - o942
  • [4] SOLVOLYSIS OF 2-PROPYL 4-NITROBENZENESULFONATE IN 1,1,1,3,3,3-HEXAFLUORO-2-PROPANOL
    DIETZE, PE
    HARIRI, R
    KHATTAK, J
    JOURNAL OF ORGANIC CHEMISTRY, 1989, 54 (14): : 3317 - 3320
  • [5] 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-nitrophenoxy)phenyl]propane
    Nawaz, H.
    Akhter, Zareen
    Bolte, Michael
    Butt, M. S.
    Siddiqi, Humaira M.
    ACTA CRYSTALLOGRAPHICA SECTION E-STRUCTURE REPORTS ONLINE, 2008, 64 : O1537 - O1537
  • [6] 1,1,1,3,3,3-hexafluoro-2,2-bis(4-hydroxyphenyl)propane-benzene (2/3)
    Csoregh, Ingeborg
    Toda, Fumio
    ACTA CRYSTALLOGRAPHICA SECTION E-CRYSTALLOGRAPHIC COMMUNICATIONS, 2007, 63 : O1769 - O1771
  • [7] 4-Fluorophenyl 4-{1,1,1,3,3,3-hexafluoro2-[4-(4-fluorobenzoyl)phenyl]-2-propyl}phenyl ketone
    de Barbarin, Cecilia Rodriguez
    Bernes, Sylvain
    Macossay, Javier
    Cassidy, Patrick E.
    ACTA CRYSTALLOGRAPHICA SECTION E-CRYSTALLOGRAPHIC COMMUNICATIONS, 2006, 62 : O3600 - O3601
  • [8] Synthesis of 2-phenylperfluoropropene and 1,1,1,3,3,3-hexafluoro-2-phenylpropane
    Bhadury, PS
    Pant, BP
    Palit, M
    Jaiswal, DK
    JOURNAL OF FLUORINE CHEMISTRY, 1997, 85 (02) : 115 - 116
  • [9] Intramolecular Friedel-Crafts Acylation Reaction Promoted by 1,1,1,3,3,3-Hexafluoro-2-propanol
    Motiwala, Hashim F.
    Vekariya, Rakesh H.
    Aube, Jeffrey
    ORGANIC LETTERS, 2015, 17 (21) : 5484 - 5487
  • [10] Crystal structure of 1,1,1,3,3,3-hexafluoro-2-propanyloxy-(2,4,6-tri-tert-butylphenylimino)phosphine
    Potschke, N
    Nieger, M
    Niecke, E
    ACTA CHEMICA SCANDINAVICA, 1997, 51 (03): : 337 - 339
12345