Microhardness of thin molybdenum films

被引：1
|
作者：
Navratil, V [1 ]
Sikola, T [1 ]
机构：
[1] TECH UNIV,INST PHYS,CZ-6000 BRNO,CZECH REPUBLIC
来源：
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1997年 / 234卷
关键词：
mechanical properties; thin films; microhardness;
D O I：
10.1016/S0921-5093(97)00158-5
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The microhardness of thin molybdenum films deposited on monocrystalline Si substrates was measured using a simple method of the extrapolation to a very thick layer. The results obtained give a relatively high value for the film hardness. We attempt to explain this by structural changes which occur in the course of the complicated growth of the films. (C) 1997 Elsevier Science S.A.
引用
收藏
页码：390 / 392
页数：3
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