The evolution of Raman spectrum of graphene with the thickness of SiO2 capping layer on Si substrate

被引:31
|
作者
Liu, Chu [1 ]
Ma, Yaoguang [1 ]
Li, Weisen [2 ]
Dai, Lun [1 ,3 ]
机构
[1] Peking Univ, State Key Lab Artificial Microstruct & Mesoscop P, Beijing 100871, Peoples R China
[2] Peking Univ, State Key Lab Nucl Phys & Technol, Beijing 100871, Peoples R China
[3] Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China
基金
中国国家自然科学基金;
关键词
NANOBELT/GRAPHENE SCHOTTKY JUNCTIONS; THERMAL-PROPERTIES; FILMS;
D O I
10.1063/1.4832063
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we have systematically studied the evolution of Raman spectrum of graphene with the thickness of SiO2 capping layer on Si substrate. We find that, for both monolayer and bilayer graphenes, the intensities of D, G, and 2D bands, together with the intensity ratio of 2D to G Raman bands (I-2D/I-G), oscillate quasi-periodically with SiO2 thickness increasing. The origin of the observed phenomena is theoretically analyzed. Our result shows that one must pay enough attention to the SiO2 thickness when using the Raman footprints, especially the commonly used I-2D/I-G, to identify the graphene layers transferred onto SiO2/Si substrate. (C) 2013 AIP Publishing LLC.
引用
收藏
页数:4
相关论文
共 50 条
  • [21] Electrical transport properties of polycrystalline CVD graphene on SiO2/Si substrate
    Kumari, Anita
    Prasad, Neetu
    Bhatnagar, P. K.
    Mathur, P. C.
    Yadav, Anil K.
    Tomy, C. V.
    Bhatia, C. S.
    DIAMOND AND RELATED MATERIALS, 2014, 45 : 28 - 33
  • [22] Direct graphene synthesis on a Si/SiO2 substrate by a simple annealing process
    Ikuta, Takashi
    Gumi, Kenta
    Ohno, Yasuhide
    Maehashi, Kenzo
    Inoue, Koichi
    Matsumoto, Kazuhiko
    MATERIALS RESEARCH EXPRESS, 2014, 1 (02):
  • [23] Effect of interfacial water formed between graphene and SiO2/Si substrate
    Koyama, Tomohiro
    Inaba, Takumi
    Komatsu, Katsuyoshi
    Moriyama, Satoshi
    Shimizu, Maki
    Homma, Yoshikazu
    APPLIED PHYSICS EXPRESS, 2017, 10 (07)
  • [24] Optical identification of MoS2/graphene heterostructure on SiO2/Si substrate
    Xu, Haiteng
    He, Dawei
    Fu, Ming
    Wang, Wenshuo
    Wu, Hongpeng
    Wang, Yongsheng
    OPTICS EXPRESS, 2014, 22 (13): : 15969 - 15974
  • [25] Si implantation in SiO2:: Stucture of Si nanocrystals and composition of SiO2 layer
    Levitcharsky, V.
    Saint-Jacques, R. G.
    Wang, Y. Q.
    Nikolova, L.
    Smirani, R.
    Ross, G. G.
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (19-20): : 8547 - 8551
  • [26] Ultrathin SiO2 on Si: III mapping the layer thickness efficiently by XPS
    Seah, MP
    White, R
    SURFACE AND INTERFACE ANALYSIS, 2002, 33 (12) : 960 - 963
  • [27] Effect of SiO2 Layer Thickness on SiO2/Si3N4 Multilayered Thin Films
    Huang, Ziming
    Duan, Jiaqi
    Li, Minghan
    Ma, Yanping
    Jiang, Hong
    COATINGS, 2024, 14 (07)
  • [28] Dependence of the stored charges and tunneling voltages on the tunneling SiO2 thickness for Si nanoparticles embedded in a SiO2 layer
    Oh, Do-Hyun
    Lee, Soojin
    Cho, Woon-Jo
    Kim, Tae Whan
    JOURNAL OF CRYSTAL GROWTH, 2008, 310 (14) : 3290 - 3293
  • [29] Reduction of graphene oxide at the interface between a Ni layer and a SiO2 substrate
    Tanaka, Hiroshige
    Obata, Seiji
    Saiki, Koichiro
    CARBON, 2013, 59 : 472 - 478
  • [30] Morphology enhancement of SiO2 aerogel films grown on Si substrate using dense SiO2 buffer layer
    Xiang-Yu Sun
    Chuan-Gui Wu
    Wen-Bo Luo
    Yao Shuai
    Wang-Li Zhang
    Rare Metals, 2023, 42 : 2457 - 2461