The evolution of Raman spectrum of graphene with the thickness of SiO2 capping layer on Si substrate

被引:31
|
作者
Liu, Chu [1 ]
Ma, Yaoguang [1 ]
Li, Weisen [2 ]
Dai, Lun [1 ,3 ]
机构
[1] Peking Univ, State Key Lab Artificial Microstruct & Mesoscop P, Beijing 100871, Peoples R China
[2] Peking Univ, State Key Lab Nucl Phys & Technol, Beijing 100871, Peoples R China
[3] Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China
基金
中国国家自然科学基金;
关键词
NANOBELT/GRAPHENE SCHOTTKY JUNCTIONS; THERMAL-PROPERTIES; FILMS;
D O I
10.1063/1.4832063
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we have systematically studied the evolution of Raman spectrum of graphene with the thickness of SiO2 capping layer on Si substrate. We find that, for both monolayer and bilayer graphenes, the intensities of D, G, and 2D bands, together with the intensity ratio of 2D to G Raman bands (I-2D/I-G), oscillate quasi-periodically with SiO2 thickness increasing. The origin of the observed phenomena is theoretically analyzed. Our result shows that one must pay enough attention to the SiO2 thickness when using the Raman footprints, especially the commonly used I-2D/I-G, to identify the graphene layers transferred onto SiO2/Si substrate. (C) 2013 AIP Publishing LLC.
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页数:4
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