In this paper, we have systematically studied the evolution of Raman spectrum of graphene with the thickness of SiO2 capping layer on Si substrate. We find that, for both monolayer and bilayer graphenes, the intensities of D, G, and 2D bands, together with the intensity ratio of 2D to G Raman bands (I-2D/I-G), oscillate quasi-periodically with SiO2 thickness increasing. The origin of the observed phenomena is theoretically analyzed. Our result shows that one must pay enough attention to the SiO2 thickness when using the Raman footprints, especially the commonly used I-2D/I-G, to identify the graphene layers transferred onto SiO2/Si substrate. (C) 2013 AIP Publishing LLC.
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Korea Univ, Dept Phys, Natl Res Lab Nano Device Phys, Seoul 136713, South KoreaKorea Univ, Dept Phys, Natl Res Lab Nano Device Phys, Seoul 136713, South Korea
Lee, Yun-Hi
Lee, Jong-Hee
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Korea Univ, Dept Phys, Natl Res Lab Nano Device Phys, Seoul 136713, South KoreaKorea Univ, Dept Phys, Natl Res Lab Nano Device Phys, Seoul 136713, South Korea
机构:
Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Sejong Univ, Inst Nano & Adv Mat Engn, Seoul 143747, South KoreaSejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Kim, Eunho
An, Hyosub
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Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Sejong Univ, Inst Nano & Adv Mat Engn, Seoul 143747, South KoreaSejong Univ, Graphene Res Inst, Seoul 143747, South Korea
An, Hyosub
Jang, Hyunchul
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Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Sejong Univ, Inst Nano & Adv Mat Engn, Seoul 143747, South KoreaSejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Jang, Hyunchul
Cho, Won-Ju
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Kwangwoon Univ, Dept Elect Mat Engn, Seoul 139701, South KoreaSejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Cho, Won-Ju
Lee, Naesung
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Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Sejong Univ, Inst Nano & Adv Mat Engn, Seoul 143747, South KoreaSejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Lee, Naesung
Lee, Wan-Gyu
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Natl Nano Fab Ctr, Taejon 305806, South KoreaSejong Univ, Graphene Res Inst, Seoul 143747, South Korea
Lee, Wan-Gyu
Jung, Jongwan
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Sejong Univ, Inst Nano & Adv Mat Engn, Seoul 143747, South KoreaSejong Univ, Graphene Res Inst, Seoul 143747, South Korea
机构:
Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Zhang, R.
Wang, Z. S.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wang, Z. S.
Zhang, Z. D.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Zhang, Z. D.
Dai, Z. G.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Dai, Z. G.
Wang, L. L.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wang, L. L.
Li, H.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Li, H.
Zhou, L.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Zhou, L.
Shang, Y. X.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Shang, Y. X.
He, J.
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机构:
Chinese Acad Sci, Inst High Energy Phys, Div Accelerators, Beijing 100049, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
He, J.
Fu, D. J.
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Wuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China
Wuhan Univ, Accelerator Lab, Sch Phys & Technol, Wuhan 430072, Peoples R ChinaWuhan Univ, Key Lab Artificial Micro & Nanomat, Minist Educ, Wuhan 430072, Peoples R China