Classical simulations of the properties of group-III nitrides

被引:36
|
作者
Chisholm, JA [1 ]
Lewis, DW [1 ]
Bristowe, PD [1 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
关键词
D O I
10.1088/0953-8984/11/22/102
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We present interatomic pair potential parameters derived for the GalnAlN system. Potentials are fitted to bulk material properties, such as lattice constants and elastic and dielectric constants, and are then employed to calculate Schottky and Frenkel defect energies in GaN, InN and AIN. Schottgy defects are found to be lower in energy than Frenkel defects, suggesting that vacancies are more readily formed in the group-III nitrides. The formation energies of both Schottky and Frenkel defects in all the nitrides are found to depend on the size of the cation. Solution energies indicate that InN readily dissolves in both GaN and AIN, at least at low concentration.
引用
收藏
页码:L235 / L239
页数:5
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