Branched copper electrodeposition on a substrate

被引:19
|
作者
Fleury, V [1 ]
Barkey, D [1 ]
机构
[1] UNIV NEW HAMPSHIRE,DEPT CHEM ENGN,DURHAM,NH 03824
来源
PHYSICA A | 1996年 / 233卷 / 3-4期
关键词
D O I
10.1016/S0378-4371(96)00202-6
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have investigated electrochemical deposition of copper on a two-dimensional substrate. This method gives almost two-dimensional robust deposits which can be withdrawn from the electrolyte. We present a preliminary study of the morphology as a function of different parameters: current density, cell thickness and substrate anisotropy.
引用
收藏
页码:730 / 741
页数:12
相关论文
共 50 条
  • [1] Branched copper electrodeposition on a substrate
    Ecole Polytechnique, Palaiseau, France
    Phys A Stat Theor Phys, 3-4 (730-741):
  • [2] STRESS DURING THE ELECTRODEPOSITION OF COPPER ON COPPER SUBSTRATE
    SADEK, H
    HALFAWY, M
    ABDU, SG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1955, 102 (05) : 226 - 228
  • [3] Study of Copper Electrodeposition Mechanism on Molybdenum Substrate
    Mercier, Dimitri
    Delbos, Elise
    El Belghiti, Hanane
    Vigneron, Jackie
    Bouttemy, Muriel
    Etcheberry, Arnaud
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2013, 160 (12) : D3103 - D3109
  • [4] Electrodeposition of porous copper as a substrate for electrocatalytic material
    Singh, Himanshu
    Dheeraj, P. B.
    Singh, Yash Pratap
    Rathore, Gaurav
    Bhardwaj, Mukesh
    JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2017, 785 : 1 - 7
  • [5] Experimental investigations on the electrodeposition of Ni on copper substrate
    Das A.
    Vundavilli P.R.
    Surekha B.
    Srinivasa Sai V.
    International Journal of Manufacturing Technology and Management, 2021, 35 (05) : 443 - 454
  • [6] Study of the Copper Electrodeposition Mechanism on Molybdenum Substrate
    Delbos, Elise
    El Belghiti, Hanane
    Mercier, Dimitri
    Vigneron, Jackie
    Bouttemy, Muriel
    Etcheberry, Arnaud
    ELECTRODEPOSITION FUNDAMENTALS AND NEW MATERIALS (GENERAL) - 222ND ECS MEETING/PRIME 2012: DIETER M. KOLB MEMORIAL SYMPOSIUM, 2013, 50 (52): : 95 - 101
  • [7] Direct electrodeposition of copper ladder structures on a silicon substrate
    Wang, Ke
    Niu, Lianping
    Zong, Zhaocun
    Zhang, Mingzhe
    Wang, Chen
    Shi, Xinjing
    Men, Yongfan
    Zou, Guangtian
    CRYSTAL GROWTH & DESIGN, 2008, 8 (02) : 442 - 445
  • [8] Multiscale simulations of copper electrodeposition onto a resistive substrate
    Drews, T.O. (todrews@uiuc.edu), 1600, IBM Corporation (49):
  • [9] Effect of the composition of polypyrrole substrate on the electrodeposition of copper and nickel
    Hepel, M
    Chen, YM
    Stephenson, R
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (02) : 498 - 505
  • [10] Multiscale simulations of copper electrodeposition onto a resistive substrate
    Drews, TO
    Krishnan, S
    Alameda, JC
    Gannon, D
    Braatz, RD
    Alkire, RC
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2005, 49 (01) : 49 - 63