Experimental study of OH, CHO, CH, and C2 radicals in C2H2/O2 and C2H2/O2/Ar flames in a closed chamber

被引：8

作者：

Marques, CST ^{[1
]}

Benvenutti, LH ^{[1
]}

Bertran, CA ^{[1
]}

机构：

[1] UNICAMP, Inst Quim, BR-13083970 Campinas, SP, Brazil

来源：

COMBUSTION SCIENCE AND TECHNOLOGY | 2001年 / 167卷 / 01期

关键词：

acetylene; combustion; excited radicals; closed chamber;

D O I：

10.1080/00102200108952179

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

An experimental study of OH*, CHO*, CH* and C-2* radicals in excited electronic states present in C2H2/O-2 and C2H2/O-2/Ar flames was carry out. Measurements of natural emissions of these species as a function of time were obtained for several combustion processes in a closed chamber. The emission times of all radicals for both C2H2/O-2 and C2H2/O-2/Ar flames were found to decrease with the increase of Phi from 0.30 to 0.68 and were almost the same Phi = 0.68, Phi = 1.00 and Phi = 1.62. CH*, The C-2* production efficiencies were almost constant in the range to Phi > 0.30, while the production efficiencies of OH* and CHO* radicals were reduced as Phi increased. The addition of argon to increase the total initial pressure had practically no effect on the chemiluminescence of radicals, except for the fuel-lean combustion (Phi = 0.30), in which the production efficiencies of excited radicals was reduced.

引用

页码：113 / 129

页数：17

共 50 条

[21] ABINITIO STUDY OF NEUTRAL O2, SO, S2, C2H2 AND THEIR MONOCATIONS AND DICATIONS
BALABAN, A
DEMARE, GR
POIRIER, RA
JOURNAL OF MOLECULAR STRUCTURE-THEOCHEM, 1989, 52 : 103 - 119
[22] Kinetics of low pressure premixed CH4/O2/Ar and C2H6/O2/Ar flames
Crunelle, B.
Pauwels, J. F.
Sochet, L. R.
Bulletin des Societes Chimiques Belges, 105 (09):
[23] Fundamental gas processes for the CVD diamond growth from H-2/C2H2/O-2 and Ar/C2H2/O-2 mixtures
Benndorf, C
Schmidt, I
Joeris, P
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1996, 154 (01): : 5 - 21
[24] EXTERNAL MAGNETIC-FIELD EFFECTS ON THE EMISSION INTENSITIES OF THE OH(A-X) AND CH(A-X) BANDS IN LOW-PRESSURE C2H2/O2 AND C3H8/O2 FLAMES
FUKUDA, Y
ABE, H
HAYASHI, H
IMAMURA, T
NAGAKURA, S
CHEMISTRY LETTERS, 1986, (05) : 777 - 780
[25] 补充“C2H2与O2混和物的爆炸实验”
徐锡忠
江苏教育, 1987, (12) : 48 - 48
[26] KINETICS OF REACTIONS OF OH RADICALS WITH C2H2 AND CO
PERRY, RA
ATKINSON, R
PITTS, JN
JOURNAL OF CHEMICAL PHYSICS, 1977, 67 (12): : 5577 - 5584
[27] THE FORMATION OF THE π•••H, F•••H AND C•••H HYDROGEN BONDS ON THE C2H2•••(HF), C2H2••• 2(HF) AND C2H2•••3(HF) COMPLEXES
Oliveira, Boaz G.
QUIMICA NOVA, 2016, 39 (03): : 320 - 327
[28] REACTIONS OF AR2+(P-3) WITH CH4, C2H2 AND NO2, OF AR2+(S-1) WITH H-2, N2, O2, CO2, C2H2 AND CH4 AND OF AR+ WITH CH4 AND NO2
STORI, H
ALGE, E
VILLINGER, H
EGGER, F
LINDINGER, W
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 1979, 30 (3-4) : 263 - 270
[29] USE OF ZEEMAN ATOMIC-ABSORPTION FLAME SPECTROMETRY FOR MEASUREMENTS IN C2H2 AIR AND C2H2/N2O FLAMES
SAKAI, T
HANAMURA, S
SMITH, BW
WINEFORDNER, JD
SPECTROSCOPY LETTERS, 1984, 17 (12) : 819 - 826
[30] GROWTH OF TEXTURED DIAMOND FILMS ON SI(100) BY C2H2/O2 FLAME METHOD
HWANG, J
ZHANG, K
KWAK, BS
ERBIL, A
FENG, ZC
JOURNAL OF MATERIALS RESEARCH, 1990, 5 (11) : 2334 - 2336

← 1 2 3 4 5 →

Experimental study of OH*, CHO*, CH*, and C2* radicals in C2H2/O2 and C2H2/O2/Ar flames in a closed chamber

Experimental study of OH, CHO, CH, and C2 radicals in C2H2/O2 and C2H2/O2/Ar flames in a closed chamber