MEMS monolithic integration technology

被引:1
|
作者
Zhang Zhao-yun [1 ]
Shi Zhi-gui [1 ]
Yang Zhen-chuan [2 ]
Peng Bo [1 ]
机构
[1] China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
[2] Peking Univ, Natl Key Lab Micro Nano Fabricat Technol, Beijing 100871, Peoples R China
来源
关键词
MEMS; Monolithic integration; Surface micromachining; Bulk micromachining; CMOS;
D O I
10.4028/www.scientific.net/KEM.562-565.1387
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The monolithic integrated technology of MEMS was discussed. First discussed the advantages and difficulties faced by the MEMS monolithic integration technology. Second the features and the process of the mainstream MEMS monolithic integration technology was introduced. And finally put forward a SOI MEMS monolithic integration technology, the technology with no high-temperature process, Post-CMOS integrated solution, compatible with the CMOS process. This technology can achieve high aspect ratio, high-performance micro-inertial devices..
引用
收藏
页码:1387 / +
页数:3
相关论文
共 50 条
  • [31] Cantilever RF-MEMS for monolithic integration with phased array antennas on a PCB
    Aguilar-Armenta, C. J.
    Porter, S. J.
    INTERNATIONAL JOURNAL OF ELECTRONICS, 2015, 102 (12) : 1978 - 1996
  • [32] Test structures for the characterisation of MEMS and CMOS integration technology
    Lin, H.
    Walton, A. J.
    Dunare, C. C.
    Stevenson, J. T. M.
    Gundlach, A. M.
    Smith, S.
    Bunting, A. S.
    ICMTS 2006: PROCEEDINGS OF THE 2006 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 2006, : 143 - +
  • [33] Integration and Evaluation of a full MEMS technology in LPA architecture
    Conte, F.
    Aubert, M.
    Ben Hamza, G.
    Bertrand, D.
    Bageshwar, V.
    Baranek, R.
    AIAA SCITECH 2024 FORUM, 2024,
  • [34] Test structures for the characterization of MEMS and CMOS integration technology
    Lin, Huamao
    Walton, Anthony J.
    Dunare, Camelia C.
    Stevenson, J. Tom M.
    Gundlach, Alan M.
    Smith, Stewart
    Bunting, Andrew S.
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2008, 21 (02) : 140 - 147
  • [35] Additive electroplating technology as a new integration concept for MEMS
    Binder, Josef
    Benecke, Wolfgang
    Proceedings of SPIE - The International Society for Optical Engineering, 3876 : 185 - 197
  • [36] RF-MEMS: Materials and technology, integration and packaging
    Tilmans, HAC
    MATERIALS, INTEGRATION AND PACKAGING ISSUES FOR HIGH-FREQUENCY DEVICES, 2004, 783 : 79 - 90
  • [37] Additive electroplating technology as a new integration concept for MEMS
    Binder, J
    Benecke, W
    MICROMACHINED DEVICES AND COMPONENTS V, 1999, 3876 : 185 - 197
  • [38] An Interconnecting Technology for RF MEMS Heterogeneous Chip Integration
    Chao, Tzu-Yuan
    Li, Chun-Hsing
    Chen, Yang Chuan
    Chen, Hsin-Yu
    Cheng, Yu-Ting
    Kuo, Chien-Nan
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (04) : 928 - 938
  • [39] MONOLITHIC OPTOELECTRONIC INTEGRATION - A NEW COMPONENT TECHNOLOGY FOR LIGHTWAVE COMMUNICATIONS
    FORREST, SR
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (12) : 2640 - 2655
  • [40] 3D Monolithic Integration: stacking technology and applications
    Radu, Ionut
    Nguyen, Bich-Yen
    Gaudin, Gweltaz
    Mazure, Carlos
    2015 INTERNATIONAL CONFERENCE ON IC DESIGN & TECHNOLOGY (ICICDT), 2015,