Impact of the Ga/In ratio on the N incorporation into (In,Ga)(As,N) quantum dots

被引:0
|
作者
Gargallo-Caballero, R. [2 ]
Guzman, A. [2 ]
Ulloa, J. M. [2 ]
Hierro, A. [2 ]
Hopkinson, M. [3 ]
Luna, E. [1 ]
Trampert, A. [1 ]
机构
[1] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
[2] Univ Politecn Madrid, ISOM, Dept Ingn Elect, ETSI Telecomunicac, E-28040 Madrid, Spain
[3] Univ Sheffield, Dept Elect & Elect Engn, Sheffield S1 3JD, S Yorkshire, England
关键词
DILUTE NITRIDES; GROWTH; GAAS; EMISSION; LASERS; LAYERS;
D O I
10.1063/1.4706559
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, we demonstrate the dependence of the nitrogen incorporation on the Ga/In content into (In,Ga)(As,N) quantum dots (QDs) grown on GaAs (100) by radio-frequency plasma assisted molecular beam epitaxy (MBE). Morphological analysis by atomic force microscopy and cross-sectional transmission electron microscopy, together with an estimation of the transition thickness, monitored in situ during the growth, predict a maximum in the N incorporation for 30% Ga content. This result is confirmed by photoluminescence measurements of the as-grown and post-growth annealed samples. We attribute this behavior to a trade off between two mechanisms depending on the Ga/In content: one related to the stability of the Ga-N bond, and the other related to the surface strain and/or In segregation. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4706559]
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页数:7
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