Optical metrology for very large convex aspheres - art. no. 701818

被引：15
|
作者：
Burge, J. H. [1 ]
Su, P. [1 ]
Zhao, C. [1 ]
机构：
[1] Univ Arizona, Coll Opt Sci, Tucson, AZ 85721 USA
来源：
ADVANCED OPTICAL AND MECHANICAL TECHNOLOGIES IN TELESCOPES AND INSTRUMENTATION, PTS 1-3 | 2008年 / 7018卷
关键词：
Aspheres; optical fabrication; optical testing; large optics;
D O I：
10.1117/12.790063
中图分类号：
V [航空、航天];
学科分类号：
08 ; 0825 ;
摘要：
Telescopes with very large diameter or with wide fields require convex secondary mirrors that may be many meters in diameter. The optical surfaces for these mirrors can be manufactured to the accuracy limited by the surface metrology. We have developed metrology systems that are specifically optimized for measuring very large convex aspheric surfaces. Large aperture vibration insensitive sub-aperture Fizeau interferometer combined with stitching software give high resolution surface measurements. The global shape is corroborated with a coordinate measuring machine based on the swing arm profilometer.
引用
收藏
页码：1818 / 1818
页数：12
相关论文
共 50 条
  • [1] Optical surface measurements for very large flat mirrors - art. no. 701817
    Burge, J. H.
    Su, P.
    Yellowhair, J.
    Zhao, C.
    ADVANCED OPTICAL AND MECHANICAL TECHNOLOGIES IN TELESCOPES AND INSTRUMENTATION, PTS 1-3, 2008, 7018 : 1817 - 1817
  • [2] Optical metrology for LEDs and solid state lighting - art. no. 604625
    Ohno, Y
    Fifth Symposium Optics in Industry, 2006, 6046 : 4625 - 4625
  • [3] New technique for flexible and rapid measurement of precision aspheres - art. no. 661629
    Garbusi, Eugenio
    Pruss, Christof
    Liesener, Jan
    Osten, Wolfgang
    OPTICAL MEASUREMENT SYSTEMS FOR INDUSTRIAL INSPECTION V, PTS 1 AND 2, 2007, 6616 : 61629 - 61629
  • [4] Enhancements to FDTD modeling for optical metrology applications - art. no. 66170U
    Salski, Bartlomiej
    Celuch, Malgorzata
    Gwarek, Wojciech
    Modeling Aspects in Optical Metrology, 2007, 6617 : U6170 - U6170
  • [5] The limits of image-based optical metrology - art. no. 61520Z
    Silver, R. M.
    Barnes, B. M.
    Attota, R.
    Jun, J.
    Filliben, J.
    Soto, J.
    Stocker, M.
    Lipscomb, P.
    Marx, E.
    Patrick, H. J.
    Dixson, R.
    Larrabee, R.
    Metrology, Inspection, and Process Control for Microlithography XX, Pts 1 and 2, 2006, 6152 : Z1520 - Z1520
  • [6] Kohler illumination for high-resolution optical metrology - art. no. 61523S
    Sohn, Yeung Joon
    Barnes, Bryan M.
    Howard, Lowell
    Silver, Richard M.
    Attota, Ravikiran
    Stocker, Michael T.
    Metrology, Inspection, and Process Control for Microlithography XX, Pts 1 and 2, 2006, 6152 : S1523 - S1523
  • [7] About the possibility to use of optical bistability effect in metrology systems - art. no. 66160Z
    Zenkova, Claudia Yu.
    OPTICAL MEASUREMENT SYSTEMS FOR INDUSTRIAL INSPECTION V, PTS 1 AND 2, 2007, 6616 : Z6160 - Z6160
  • [8] Fundamental limits of optical critical dimension metrology: A simulation study - art. no. 65180U
    Silver, Richard
    Germer, Thomas
    Attota, Ravikiran
    Barnes, Bryan M.
    Bunday, Benjamin
    Allgair, John
    Marx, Egon
    Jun, Jay
    Metrology, Inspection, and Process Control for Microlithography XXI, Pts 1-3, 2007, 6518 : U5180 - U5180
  • [9] Overlay metrology tool calibration - art. no. 65180I
    Binns, L. A.
    Dasari, P.
    Smith, N. P.
    Ananew, G.
    Fink, H.
    Metrology, Inspection, and Process Control for Microlithography XXI, Pts 1-3, 2007, 6518 : I5180 - I5180
  • [10] Phase and absorption metrology for thick photopolymer devices - art. no. 633502
    Sullivan, Amy C.
    Ayres, Mark R.
    McLeod, Robert R.
    Organic Holographic Materials and Applications IV, 2006, 6335 : 33502 - 33502
12345