Recent progress in high resolution lithography

被引：218

作者：

Bratton, D ^{[1
]}

Yang, D ^{[1
]}

Dai, JY ^{[1
]}

Ober, CK ^{[1
]}

机构：

[1] Cornell Univ, Ithaca, NY 14853 USA

来源：

POLYMERS FOR ADVANCED TECHNOLOGIES | 2006年 / 17卷 / 02期

关键词：

lithography; extreme ultraviolet (EUV); molecular glass; block copolymers; nanotechnology;

D O I：

10.1002/pat.662

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to "unconventional" soft lithography and the self-assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two-photon lithography, step-and-flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright (c) 2006 John Wiley & Sons, Ltd.

引用

页码：94 / 103

页数：10

共 50 条

[41] GENERAL PROBLEMS OF HIGH-RESOLUTION LITHOGRAPHY
MLADENOV, GM
SEYFARTH, H
VACUUM, 1986, 36 (10) : 649 - 653
[42] Future trends in high-resolution lithography
Lawes, RA
APPLIED SURFACE SCIENCE, 2000, 154 : 519 - 526
[43] DEEP ULTRAVIOLET HIGH-RESOLUTION LITHOGRAPHY
MCCULLOUGH, AW
SEWELL, H
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 394 : 107 - 113
[44] Simple high resolution nanoimprint-lithography
Haeffner, M.
Heeren, A.
Fleischer, M.
Kern, D. P.
Schmidt, G.
Molenkamp, L. W.
MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 937 - 939
[45] Past Progress, Current Status and Future Perspective of Digital EUV Lithography for High-Resolution Semiconductor Manufacturing
Chen, Yijian
Song, Chunyan
Gao, Junhua
Li, Xijun
NOVEL PATTERNING TECHNOLOGIES 2024, 2024, 12956
[46] Recent advances in lithography and high level critical dimension metrology needs for lithography
Hector, S
Characterization and Metrology for ULSI Technology 2005, 2005, 788 : 359 - 368
[47] An update on the progress in high-n immersion lithography
Sewell, Harry
Graeupner, Paul
McCafferty, Diane
Markoya, Louis
Samarakone, Nandasiri
van Wijnen, Paul
Mulkens, Jan
Benschop, Jos
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2008, 21 (05) : 613 - 620
[48] Recent Progress on Spatial and Thematic Resolution in Landscape Ecology
Alex Mark Lechner
Jonathan R. Rhodes
Current Landscape Ecology Reports, 2016, 1 (2) : 98 - 105
[49] Recent progress in enzymatic resolution and desymmetrization of pharmaceuticals and their intermediates
Pesti, JA
DiCosimo, R
CURRENT OPINION IN DRUG DISCOVERY & DEVELOPMENT, 2003, 6 (06) : 884 - 901
[50] RECENT PROGRESS IN HIGH-RESOLUTION DEPTH PROFILING AND INTERFACE ANALYSIS OF THIN-FILMS
OECHSNER, H
VACUUM, 1987, 37 (10) : 763 - 768

← 1 2 3 4 5 →