Recent progress in high resolution lithography

被引：218

作者：

Bratton, D ^{[1
]}

Yang, D ^{[1
]}

Dai, JY ^{[1
]}

Ober, CK ^{[1
]}

机构：

[1] Cornell Univ, Ithaca, NY 14853 USA

来源：

POLYMERS FOR ADVANCED TECHNOLOGIES | 2006年 / 17卷 / 02期

关键词：

lithography; extreme ultraviolet (EUV); molecular glass; block copolymers; nanotechnology;

D O I：

10.1002/pat.662

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to "unconventional" soft lithography and the self-assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two-photon lithography, step-and-flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright (c) 2006 John Wiley & Sons, Ltd.

引用

页码：94 / 103

页数：10

共 50 条

[1] Recent progress in soft lithography
Rogers, John A.
Nuzzo, Ralph G.
MATERIALS TODAY, 2005, 8 (02) : 50 - 56
[2] Plasmonic Lithography: Recent Progress
Hong, Fan
Blaikie, Richard
ADVANCED OPTICAL MATERIALS, 2019, 7 (14)
[3] Recent progress in high-resolution observations
Berger, TE
Title, AM
Solar-B Mission and the Forefront of Solar Physics, Proceedings, 2004, 325 : 95 - 104
[4] Recent Progress in Nanofabrication of High Resolution X-Ray Zone Plate Lenses by Electron Beam Lithography
Chen Yifang
ACTA OPTICA SINICA, 2022, 42 (11)
[5] Recent progress in synchrotron radiation lithography
NTT LSI Laboratories, 3-1, Morinosato Wakamiya, Atsugi-Shi, Kanagawa 243-01, Japan
J Electron Spectrosc Relat Phenom, (321-327):
[6] Recent progress in synchrotron radiation lithography
Deguchi, K
Miyoshi, K
Matsuda, T
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1996, 80 : 321 - 327
[7] Recent progress in synchrotron radiation lithography
J Electron Spectrosc Relat Phenom, (321):
[8] Recent progress in high-resolution functional MRI
Cheng, Kang
CURRENT OPINION IN NEUROLOGY, 2011, 24 (04) : 401 - 408
[9] RECENT PROGRESS IN KRF EXCIMER LASER LITHOGRAPHY
NAKASE, M
IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (01) : 26 - 31
[10] Recent progress in the development of sources for EUV lithography
O'Sullivan, G
Cummings, A
Dunne, P
Fahy, K
Hayden, P
McKinney, L
Murphy, N
Sokell, E
White, J
ATOMIC AND MOLECULAR DATA AND THEIR APPLICATIONS, 2005, 771 : 108 - 117

← 1 2 3 4 5 →