The electronic structure of ε-Ga2O3

被引:58
|
作者
Mulazzi, M. [1 ,2 ]
Reichmann, F. [3 ]
Becker, A. [3 ]
Klesse, W. M. [3 ]
Alippi, P. [4 ]
Fiorentini, V. [5 ,6 ]
Parisini, A. [7 ]
Bosi, M. [8 ]
Fornari, R. [7 ,8 ]
机构
[1] Humboldt Univ, Inst Phys, Newtonstr 15, D-12489 Berlin, Germany
[2] Leibniz Inst Kristallzuchtung, Max Born Str 2, D-12489 Berlin, Germany
[3] IHP, Technol Pk 25, D-15236 Frankfurt, Oder, Germany
[4] CNR, ISM, Via Salaria Km 29,300, I-00015 Rome, Italy
[5] Cagliari Univ, Dept Phys, I-09042 Monserrato, CA, Italy
[6] Cagliari Univ, CNR, UOS, IOM, I-09042 Monserrato, CA, Italy
[7] Parma Univ, Dept Math Phys & Comp Sci, Viale Sci 7-A, I-43124 Parma, Italy
[8] CNR, Inst Elect & Magnet Mat, Viale Sci 37-A, I-43124 Parma, Italy
来源
APL MATERIALS | 2019年 / 7卷 / 02期
关键词
D O I
10.1063/1.5054395
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The electronic structure of epsilon-Ga2O3 thin films has been investigated by ab initio calculations and photoemission spectroscopy with UV, soft, and hard X-rays to probe the surface and bulk properties. The latter measurements reveal a peculiar satellite structure in the Ga 2p core level spectrum, absent at the surface, and a core-level broadening that can be attributed to photoelectron recoil. The photoemission experiments indicate that the energy separation between the valence band and the Fermi level is about 4.4 eV, a valence band maximum at the Gamma point and an effective mass of the highest lying bands of -4.2 free electron masses. The value of the bandgap compares well with that obtained by optical experiments and with that obtained by calculations performed using a hybrid density-functional, which also reproduce well the dispersion and density of states. (C) 2019 Author(s).
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页数:6
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