High accuracy flatness metrology within the European Metrology Research Program

被引：6

作者：

Schulz, Michael ^{[1
]}

Ehret, Gerd ^{[1
]}

Kren, Petr ^{[2
]}

机构：

[1] Phys Tech Bundesanstalt, D-38116 Braunschweig, Germany

[2] CMI, CZ-15000 Prague, Czech Republic

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2013年 / 710卷

关键词：

Flatness metrology; Interferometry; Deflectometry; Capacitive distance sensors; Nanometrology; European Metrology Research Program; AUTOCOLLIMATOR; SURFACES;

D O I：

10.1016/j.nima.2012.10.112

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Recently, a project within the European Metrology Research Program (EMRP) started with the aim of improving the form metrology of optical surfaces. Within this project, in a work package on high accuracy flatness metrology, the National Metrology Institutes of the Czech Republic (CMI) and Germany (PTB) are involved. In the following, this EMRP project, the capabilities of CMI and PTB and the aims of the project will be presented. The new developments in flatness metrology cover the reduction of uncertainty, the enhancement of lateral resolution of deflectometric methods and the test of capacitive sensors for flatness metrology. (c) 2012 Elsevier B.V. All rights reserved.

引用

页码：37 / 41

页数：5

共 50 条

[1] Metrology for decommissioning nuclear facilities: Partial outcomes of joint research project within the European Metrology Research Program
Suran, Jiri
Kovar, Petr
Smoldasova, Jana
Solc, Jaroslav
Van Ammel, Raf
Miranda, Maria Garcia
Russell, Ben
Arnold, Dirk
Zapata-Garcia, Daniel
Boden, Sven
Rogiers, Bart
Sand, Johan
Perajarvi, Kari
Holm, Philip
Hay, Bruno
Failleau, Guillaume
Plumeri, Stephane
Beck, Yves Laurent
Grisa, Tomas
[J]. APPLIED RADIATION AND ISOTOPES, 2018, 134 : 351 - 357
[2] PROGRESS ON THE EUROPEAN METROLOGY RESEARCH PROJECT "METROLOGY FOR SOLID STATE LIGHTING"
Hall, Simon
Miller, Paul
[J]. 27TH SESSION OF THE CIE, VOL. 1, PTS 1 AND 2, 2011, : 502 - 503
[3] Complementary metrology within a European joint laboratory
Nutsch, A.
Beckhoff, B.
Altmann, R.
Van Den Berg, J. A.
Giubertoni, D.
Hoenicke, P.
Bersani, M.
Leibold, A.
Meirer, F.
Mueller, M.
Pepponi, G.
Otto, M.
Petrik, P.
Reading, M.
Pfitzner, L.
Ryssel, H.
[J]. ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES IX: UCPSS 2008-9TH INTERNATIONAL SYMPOSIUM ON ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES (UCPSS), 2009, 145-146 : 97 - +
[4] The transition to optical wafer flatness metrology
Valley, JF
Poduje, N
[J]. CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 2003, 683 : 413 - 420
[5] Theoferometer for high accuracy optical alignment and metrology
Toland, R
Leviton, D
Koterba, S
[J]. SPACE SYSTEMS ENGINEERING AND OPTICAL ALIGNMENT MECHANISMS, 2004, 5528 : 305 - 315
[6] ACCURACY OF SPATIAL METROLOGY
HARRIS, K
NADLERNIV, I
LEVY, D
[J]. INTEGRATED CIRCUIT METROLOGY, INSPECTION, AND PROCESS CONTROL III, 1989, 1087 : 56 - 62
[7] Status and Strategy for Moisture Metrology in European Metrology Institutes
Bell, S.
Boese, N.
Bosma, R.
Buzoianu, M.
Carroll, P.
Fernicola, V.
Georgin, E.
Heinonen, M.
Kentved, A.
Melvad, C.
Nielsen, J.
[J]. INTERNATIONAL JOURNAL OF THERMOPHYSICS, 2015, 36 (08) : 2185 - 2198
[8] Status and Strategy for Moisture Metrology in European Metrology Institutes
S. Bell
N. Boese
R. Bosma
M. Buzoianu
P. Carroll
V. Fernicola
E. Georgin
M. Heinonen
A. Kentved
C. Melvad
J. Nielsen
[J]. International Journal of Thermophysics, 2015, 36 : 2185 - 2198
[9] Alignment methods for ultraprecise deflectometric flatness metrology
Ehret, Gerd
Schulz, Michael
Fitzenreiter, Arne
Baier, Maik
Joeckel, Wolfgang
Stavridis, Manuel
Elster, Clemens
[J]. OPTICAL MEASUREMENT SYSTEMS FOR INDUSTRIAL INSPECTION VII, 2011, 8082
[10] METROLOGY FOR RADIOLOGICAL EARLY WARNING NETWORKS IN EUROPE ("METROERM")-A JOINT EUROPEAN METROLOGY RESEARCH PROJECT
Neumaier, Stefan
Dombrowski, Harald
Kessler, Patrick
[J]. HEALTH PHYSICS, 2016, 111 (02): : 100 - 105

← 1 2 3 4 5 →