Sub-10nm patterns defined by electron beam lithography and molecular liftoff

被引：0
|
作者：
Gao, Bo
Bernstein, Gary
Lieberman, Marya
机构：
[1] Univ Notre Dame, Dept Chem & Biochem, Notre Dame, IN 46556 USA
[2] Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2006年 / 231卷
关键词：
D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
23-COLL
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页数：2
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