Nanotwin hardening in a cubic chromium oxide thin film

被引：4

作者：

Suzuki, Kazuma ^{[1
]}

Suzuki, Tsuneo ^{[1
]}

Nakajima, Yoshiharu ^{[2
]}

Matsui, Yoshio ^{[3
]}

Suematsu, Hisayuki ^{[1
]}

Nakayama, Tadachika ^{[1
]}

Niihara, Koichi ^{[1
]}

机构：

[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan

[2] Nagaoka Univ Technol, Nagaoka, Niigata 9402188, Japan

[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan

来源：

APL MATERIALS | 2015年 / 3卷 / 09期

关键词：

VANADIUM-OXIDES; OXYGEN-CONTENT; OXIDATION; HARDNESS; GROWTH; XPS;

D O I：

10.1063/1.4931749

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

NaCl-type (B1) chromium oxide (CrO) has been expected to have a high hardness value and does not exist as an equilibrium phase. We report a B1-based Cr0.67O thin film with a thickness of 144 nm prepared by pulsed laser deposition as an epitaxial thin film on a MgO single crystal. The thin film contained a number of stacking faults and had a nanotwinned structure composed of B1 with disordered vacancies and corundum structures. The Cr0.67O thin film had a high indentation hardness value of 44 GPa, making it the hardest oxide thin film reported to date. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.

引用

页数：6

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