Nanotwin hardening in a cubic chromium oxide thin film

被引：4
|
作者：
Suzuki, Kazuma [1 ]
Suzuki, Tsuneo [1 ]
Nakajima, Yoshiharu [2 ]
Matsui, Yoshio [3 ]
Suematsu, Hisayuki [1 ]
Nakayama, Tadachika [1 ]
Niihara, Koichi [1 ]
机构：
[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan
[2] Nagaoka Univ Technol, Nagaoka, Niigata 9402188, Japan
[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
来源：
APL MATERIALS | 2015年 / 3卷 / 09期
关键词：
VANADIUM-OXIDES; OXYGEN-CONTENT; OXIDATION; HARDNESS; GROWTH; XPS;
D O I：
10.1063/1.4931749
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
NaCl-type (B1) chromium oxide (CrO) has been expected to have a high hardness value and does not exist as an equilibrium phase. We report a B1-based Cr0.67O thin film with a thickness of 144 nm prepared by pulsed laser deposition as an epitaxial thin film on a MgO single crystal. The thin film contained a number of stacking faults and had a nanotwinned structure composed of B1 with disordered vacancies and corundum structures. The Cr0.67O thin film had a high indentation hardness value of 44 GPa, making it the hardest oxide thin film reported to date. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
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页数：6
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