Deposition of thin films of gallium sulfide from a novel liquid single-source precursor, Ga(SOCNEt2)3, by aerosol-assisted CVD

被引：0
|
作者：
Horley, GA [1 ]
Lazell, MR [1 ]
O'Brien, P [1 ]
机构：
[1] Univ London Imperial Coll Sci Technol & Med, Dept Chem, London SW7 2AY, England
来源：
CHEMICAL VAPOR DEPOSITION | 1999年 / 5卷 / 05期
关键词：
D O I：
10.1002/(SICI)1521-3862(199910)5:5<203::AID-CVDE203>3.0.CO;2-L
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Group III chalcogenides are interesting materials for photovoltaic and optoelectronic devices. Here the synthesis and use of a novel, single-source precursor for the deposition of face-centered cubic GaS by aerosol-assisted CVD is described. The films show a high degree of orientation and an unusual spherical morphology arranged in a reasonably uniform array on the substrate (see Figure).
引用
下载
收藏
页码：203 / +
页数：4
相关论文
共 50 条
  • [1] Deposition of thin films of Gallium sulfide from a novel liquid single-source precursor, Ga(SOCNEt2)3, by aerosol-assisted CVD
    Department of Chemistry, Imp. Coll. Sci., Technol. and Med., Exhibition Road, South Kensington, London SW7 2AY, United Kingdom
    不详
    Chem Vapor Deposition, 5 (203-205):
  • [2] Synthesis and characterization of gallium thiocarboxylates as novel single-source precursors to gallium sulfide thin films by aerosol-assisted CVD
    Shang, GH
    HampdenSmith, MJ
    Duesler, EN
    CHEMICAL COMMUNICATIONS, 1996, (15) : 1733 - 1734
  • [3] The Aerosol-Assisted CVD of Silver Films from Single-Source Precursors
    Panneerselvam, Arunkumar
    Malik, Mohammad A.
    O'Brien, Paul
    Helliwell, Madeleine
    CHEMICAL VAPOR DEPOSITION, 2009, 15 (1-3) : 57 - 63
  • [4] Aerosol-assisted chemical vapor deposition of copper sulfide nanostructured thin film from newly synthesized single-source precursor
    Saeed, Sohail
    Rashid, Naghmana
    Ahmad, Khurram Shahzad
    TURKISH JOURNAL OF CHEMISTRY, 2013, 37 (05) : 796 - 804
  • [5] Iron sulfide (FeS2) thin films from single-source precursors by aerosol-assisted chemical vapor deposition (AACVD)
    O'Brien, P
    Otway, DJ
    Park, JH
    CHEMICAL PROCESSING OF DIELECTRICS, INSULATORS AND ELECTRONIC CERAMICS, 2000, 606 : 133 - 138
  • [6] Deposition of Ni and Pd sulfide thin films via aerosol-assisted CVD
    O'Brien, Paul
    Waters, John
    CHEMICAL VAPOR DEPOSITION, 2006, 12 (10) : 620 - 626
  • [7] Organotin Dithiocarbamates: Single-Source Precursors for Tin Sulfide Thin Films by Aerosol-Assisted Chemical Vapor Deposition (AACVD)
    Ramasamy, Karthik
    Kuznetsov, Vladimir L.
    Gopal, Kandasamy
    Malik, Mohammad A.
    Raftery, James
    Edwards, Peter P.
    O'Brien, Paul
    CHEMISTRY OF MATERIALS, 2013, 25 (03) : 266 - 276
  • [8] Deposition of thin films of gallium sulfide from a novel single-source precursor, Ga(S2CNMeHex)3, by low-pressure metal-organic chemical vapor deposition
    Lazell, MR
    O'Brien, P
    Otway, DJ
    Park, JH
    CHEMISTRY OF MATERIALS, 1999, 11 (12) : 3430 - +
  • [9] The CVD of silver sulfide and silver thin films from a homoleptic crystalline single-source precursor
    Panneerselvam, Arunkumar
    Malik, Mohammad A.
    O'Brien, Paul
    Raftery, James
    JOURNAL OF MATERIALS CHEMISTRY, 2008, 18 (27) : 3264 - 3269
  • [10] Bis(piperidinedithiocarbamato)pyridinecadmium(II) as a single-source precursor for the synthesis of CdS nanoparticles and aerosol-assisted chemical vapour deposition (AACVD) of CdS thin films
    Mlowe, Sixberth
    Lewis, David J.
    Malik, M. Azad
    Raftery, James
    Mubofu, Egid B.
    O'Brien, Paul
    Revaprasadu, Neerish
    NEW JOURNAL OF CHEMISTRY, 2014, 38 (12) : 6073 - 6080
12345