A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

被引：24
|
作者：
De Marco, Carmela [1 ]
Gaidukeviciute, Arune [2 ]
Kiyan, Roman [2 ]
Eaton, Shane M. [3 ]
Levi, Marinella [1 ]
Osellame, Roberto [3 ]
Chichkov, Boris N. [2 ]
Turri, Stefano [1 ]
机构：
[1] Politecn Milan, Dipartimento Chim Mat & Ingn Chim Giulio Natta, I-20133 Milan, Italy
[2] Laser Zentrum Hannover eV, D-30419 Hannover, Germany
[3] CNR, Ist Foton & Nanotecnol, I-20133 Milan, Italy
来源：
LANGMUIR | 2013年 / 29卷 / 01期
关键词：
TECHNOLOGY; NANOSCALE; SHRINKAGE; ELEMENTS;
D O I：
10.1021/la303799u
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.
引用
收藏
页码：426 / 431
页数：6
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