Electrical conduction mechanism of Zn:SiOx resistance random access memory with supercritical CO2 fluid process

被引:40
|
作者
Chang, Kuan-Chang [1 ]
Tsai, Tsung-Ming [1 ]
Zhang, Rui [2 ]
Chang, Ting-Chang [3 ,4 ]
Chen, Kai-Huang [5 ]
Chen, Jung-Hui [6 ]
Young, Tai-Fa [7 ]
Lou, J. C. [2 ]
Chu, Tian-Jian [1 ]
Shih, Chih-Cheng [6 ]
Pan, Jhih-Hong [1 ]
Su, Yu-Ting [3 ]
Syu, Yong-En [3 ]
Tung, Cheng-Wei [1 ]
Chen, Min-Chen [3 ]
Wu, Jia-Jie [8 ]
Hu, Ying [8 ]
Sze, Simon M. [9 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Kaohsiung 804, Taiwan
[2] Peking Univ, Sch Software & Microelect, Beijing 100871, Peoples R China
[3] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[4] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 700, Taiwan
[5] Tung Fang Design Univ, Dept Elect Engn & Comp Sci, Kaohsiung, Taiwan
[6] Natl Kaohsiung Normal Univ, Dept Chem, Kaohsiung, Taiwan
[7] Natl Sun Yat Sen Univ, Dept Mech & Electromech Engn, Kaohsiung 80424, Taiwan
[8] Xidian Univ, Sch Tech Phys, Xian, Shanxi, Peoples R China
[9] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
关键词
16;
D O I
10.1063/1.4819162
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, the electrical conduction mechanism of Zn:SiOx resistance random access memory (RRAM) treated with supercritical CO2 fluid (SCCO2) process was investigated by low temperature measurement. The current of low resistance state for current-voltage curves in SCCO2-treated and untreated Zn:SiOx RRAM were measured and compared under a low temperature range from 100K to 298 K. The electrical conduction mechanisms of hopping conduction and metal-like behaviors in SCCO2-treated and untreated Zn:SiOx RRAM were discussed, respectively. Finally, the electrical conduction mechanism was analyzed and verified by the chemical composition and bonding intensity of XPS analyses. (C) 2013 AIP Publishing LLC.
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页数:3
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