Controlled kinetic Monte Carlo simulation of laser improved nano particle deposition process

被引:6
|
作者
Song, Ji-Hyeon [1 ,2 ]
Choi, Kweon-Hoon [2 ]
Dai, Ruonan [2 ]
Choi, Jung-Oh [1 ]
Ahn, Sung-Hoon [1 ,3 ,4 ]
Wang, Yan [2 ]
机构
[1] Seoul Natl Univ, Dept Mech & Aerosp Engn, Bldg 301,Room 1205, Seoul 151742, South Korea
[2] Georgia Inst Technol, Woodruff Sch Mech Engn, 801 Ferst Dr NW, Atlanta, GA 30332 USA
[3] Seoul Natl Univ, Inst Adv Machinery & Design, Seoul, South Korea
[4] Seoul Natl Univ, Inst Engn Res, Seoul, South Korea
基金
美国国家科学基金会; 新加坡国家研究基金会;
关键词
Laser sintering; Nano particle deposition system; Controlled kinetic Monte Carlo; Thin film analysis; Porosity; Gaussian process regression; MOLECULAR-DYNAMICS SIMULATION; AEROSOL DEPOSITION; NUMERICAL-SIMULATION; MICROSTRUCTURAL EVOLUTION; ROOM-TEMPERATURE; NANOPARTICLES; POROSITY; MULTISCALE; LAYERS; SCALE;
D O I
10.1016/j.powtec.2017.11.044
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Thin film coating is important in many applications such as electrodes, sensors, and energy devices. Nano particle deposition is one of the most used additive manufacturing processes for coating. It has advantages of efficiency, cost effectiveness, and ease of controlling film properties. Recent experimental studies showed that laser can enhance the efficiency of the deposition process. However, there is still a lack of fundamental understanding of the laser treatment effect on nano particles, which makes process control difficult and ad hoc. In this research, the effect of laser treatment on morphological change of films in the nano particle deposition system is studied with controlled kinetic Monte Carlo (cKMC) simulation. cKMC is a generalized version of classical kinetic Monte Carlo, which can be used to simulate both controlled and self-assembly processes at atomistic level with larger sizes and longer time scales than molecular dynamics. In this work, a coarse-grained cKMC model is constructed to simulate diffusion, laser irradiation, and deposition processes simultaneously. The simulation model is calibrated with experimental data. Different laser irradiation conditions on alumina particles are studied, which result in different thickness and porosity of the deposited layers. A Gaussian process regression modeling approach is also developed for model validation with the consideration of observation bias and discrepancy. Simulation results are in good agreement with the experimental results. (C) 2017 Published by Elsevier B.V.
引用
收藏
页码:651 / 658
页数:8
相关论文
共 50 条
  • [31] Kinetic Monte Carlo Simulation of Metallic Nanoislands Grown by Physical Vapor Deposition
    Bhuiyan, Abuhanif K.
    Dew, S. K.
    Stepanova, M.
    COMMUNICATIONS IN COMPUTATIONAL PHYSICS, 2011, 9 (01) : 49 - 67
  • [32] Kinetic Monte Carlo Simulation of Deposition of Co Thin Film on Cu(001)
    刘祖黎
    石艳丽
    荆兴斌
    喻莉
    姚凯伦
    Plasma Science and Technology, 2007, 9 (05) : 550 - 555
  • [33] Efficient kinetic Monte Carlo simulation
    Schulze, Tim P.
    JOURNAL OF COMPUTATIONAL PHYSICS, 2008, 227 (04) : 2455 - 2462
  • [34] Monte Carlo simulation of polydisperse particle deposition and coagulation dynamics in enclosed chambers
    Liu, Hongmei
    Jiang, Wei
    Liu, Wenming
    Liu, Xuedong
    Liu, Shuyuan
    Chan, Tat Leung
    VACUUM, 2021, 184
  • [35] 3-D Monte Carlo simulation of particle deposition on a permeable surface
    Li, Yanling
    Vu, Nam
    Kim, Albert S.
    DESALINATION, 2009, 249 (01) : 416 - 422
  • [36] Monte Carlo simulation of particle segregation
    Castier, M
    Cuellar, OD
    Tavares, FW
    POWDER TECHNOLOGY, 1998, 97 (03) : 200 - 207
  • [37] Monte Carlo simulation of particle beams
    Jansen, G.H.
    Advances in Imaging and Electron Physics, 2024, 230 : 393 - 436
  • [38] Monte Carlo simulation of particle behaviour
    Smith, Lyndon
    Metal Powder Report, 2001, 56 (01) : 32 - 35
  • [39] Submonolayer growth of BaTiO3 thin film via pulsed laser deposition: A kinetic Monte Carlo simulation
    Zhu, Z.
    Zheng, X. J.
    Li, W.
    JOURNAL OF APPLIED PHYSICS, 2009, 106 (05)
  • [40] An Improved Monte Carlo (MC) Dose Simulation For Charged Particle Cancer Therapy
    Ying, C. K.
    Kamil, W. A.
    Shuaib, I. L.
    Matsufuji, Naruhiro
    ADVANCING NUCLEAR RESEARCH AND ENERGY DEVELOPMENT, 2014, 1584 : 97 - 100