Pseudo-interface formation and diffusion behaviour in the B2 phase region of NiAl-base diffusion couples

被引：6
|
作者：
Kainuma, R
Ikenoya, H
Ohnuma, I
Ishida, K
机构：
[1] TOHOKU UNIV,FAC ENGN,DEPT MAT SCI,SENDAI,MIYAGI 980,JAPAN
[2] MITSUBISHI MAT CORP,NUCL ENERGY CTR,TOKYO,JAPAN
来源：
DEFECT AND DIFFUSION FORUM | 1997年 / 143卷
关键词：
NiAl base systems; up-hill diffusion; thermodynamic factor; pseudo-interface; diffusion couple;
D O I：
10.4028/www.scientific.net/DDF.143-147.425
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The microstructure and concentration profiles in the B2 phase region of the diffusion couples of Ni-AI-X (X: Ti, V, Cr, Mn, Fe, Co and Cu) ternary systems were examined by EPMA. A pseudo-interface between beta(1) (low Al) / beta(2) (high Al) characterized by a sharp change in the concentration profiles of both Al and the alloying element is observed in composition range near 50at%Al. The characteristic features of the concentration profiles in the Ni-AL base ternary diffusion couples are presented and the up-hill diffusion of alloying elements observed at the pseudo-interface of the Ni-AI-X (X: Ti, V, Cr, Mn, Fe, Co and Cu) ternary systems is discussed from a thermodynamic point of view.
引用
收藏
页码：425 / 430
页数：6
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