Single-step electrodeposition of superhydrophobic black NiO thin films
被引:18
|
作者:
Bahramian, A.
论文数: 0引用数: 0
h-index: 0
机构:
Aix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, FranceAix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, France
Bahramian, A.
[1
]
Eyraud, M.
论文数: 0引用数: 0
h-index: 0
机构:
Aix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, FranceAix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, France
Eyraud, M.
[1
]
Vacandio, F.
论文数: 0引用数: 0
h-index: 0
机构:
Aix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, FranceAix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, France
Vacandio, F.
[1
]
Hornebecq, V
论文数: 0引用数: 0
h-index: 0
机构:
Aix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, FranceAix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, France
Hornebecq, V
[1
]
Djenizian, T.
论文数: 0引用数: 0
h-index: 0
机构:
Ctr Microelect Provence, Dept Flexible Elect, F-13541 Mines St Etienne, Gardanne, FranceAix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, France
Djenizian, T.
[2
]
Knauth, P.
论文数: 0引用数: 0
h-index: 0
机构:
Aix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, FranceAix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, France
Knauth, P.
[1
]
机构:
[1] Aix Marseille Univ, CNRS, Madirel, UMR 7246,Electrochem Mat Grp, Campus St Jerome, F-13013 Marseille, France
[2] Ctr Microelect Provence, Dept Flexible Elect, F-13541 Mines St Etienne, Gardanne, France
Black finished surfaces have extensive applications in many domains, such as optics, solar cells, and aerospace. The single-step electrodeposition of superhydrophobic black NiO films from a dimethyl sulfoxide-based electrolyte is described in this paper. The physicochemical properties of the obtained film were characterized using scanning electron microscopy, X-ray diffraction, and electrochemical tests (electrochemical impedance spectroscopy and potentiodynamic polarization). A rough surface with a low reflection of light was formed after the deposition process that increased the contact angle of water from about 87 degrees (for bare Cu) to 163 degrees (in presence of the black coating), which improved the corrosion resistance of the Cu substrate by about 30%. The formed black NiO film revealed a notably high stability and kept its appearance even after corrosion tests. [GRAPHICS] .
机构:
Shivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, India
Dongguk Univ, Dept Semicond Sci, Seoul 100715, South KoreaShivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, India
Inamdar, A. I.
Sonavane, A. C.
论文数: 0引用数: 0
h-index: 0
机构:
Shivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, IndiaShivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, India
Sonavane, A. C.
Sharma, S. K.
论文数: 0引用数: 0
h-index: 0
机构:
Dongguk Univ, Dept Elect Engn, Millimeter Wave Innovat Technol Res Ctr, Seoul 100715, South KoreaShivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, India
Sharma, S. K.
Im, Hyunsik
论文数: 0引用数: 0
h-index: 0
机构:
Dongguk Univ, Dept Semicond Sci, Seoul 100715, South KoreaShivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, India
Im, Hyunsik
Patil, P. S.
论文数: 0引用数: 0
h-index: 0
机构:
Shivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, IndiaShivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, India
机构:
Hanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South Korea
Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, IndiaHanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South Korea
Lokhande, C. D.
Kulkarni, S. S.
论文数: 0引用数: 0
h-index: 0
机构:
Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, IndiaHanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South Korea
Kulkarni, S. S.
Mane, Rajaram S.
论文数: 0引用数: 0
h-index: 0
机构:
Hanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South KoreaHanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South Korea
Mane, Rajaram S.
Nandi, K. C.
论文数: 0引用数: 0
h-index: 0
机构:
Pune Inst Comp Technol, Soc Comp Technol & Res, Pune 411043, Maharashtra, IndiaHanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South Korea
Nandi, K. C.
Han, Sung-Hwan
论文数: 0引用数: 0
h-index: 0
机构:
Hanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South KoreaHanyang Univ, Dept Chem, Inorgan Nanomat Lab, Sungdong Ku, Seoul 133791, South Korea