First-principles study of clean tungsten surface work function under electric field

被引:11
|
作者
Wang, Yue [1 ]
Xu, Liangliang [1 ]
Hsu, Hua-Yi [2 ]
Leung, Tsan-Chuen [3 ]
Lin, Ming-Chieh [1 ]
机构
[1] Hanyang Univ, Dept Elect & Biomed Engn, Multidisciplinary Computat Lab, Seoul 04763, South Korea
[2] Natl Taipei Univ Technol, Dept Mech Engn, Taipei 10608, Taiwan
[3] Natl Chung Cheng Univ, Dept Phys, Chiayi 62101, Taiwan
来源
基金
新加坡国家研究基金会;
关键词
ULTRASOFT PSEUDOPOTENTIALS; THERMIONIC EMISSION; MICROSCOPY; METALS; ENERGY;
D O I
10.1116/1.5140750
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effect of an external electric field on the work functions of clean tungsten (W) surfaces, W (100), W (110), and W (111) has been investigated using first-principles calculations based on density functional theory. By applying an electric field from 0 up to 0.3V/angstrom, the effective and local work functions can be determined for comparison after employing five different pseudopotentials. It is found that as the electric field increases, the work functions of tungsten surfaces reduce accordingly. A reduction of work function can be as large as similar to 0.35eV. Based on these calculations, a new scaling law of work function reduction due to the charge transfer near the metal/vacuum interface caused by an external electric field is obtained. In addition, the local work function is found to be closely related to the charge density distribution. With this approach, field emission properties of metals can be better understood and described.
引用
收藏
页数:7
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