Investigation of electrically stressed SF4 gas by using FT-IR spectroscopy

被引:0
|
作者
Heise, HM [1 ]
Janissek, PR [1 ]
Kurte, R [1 ]
Fischer, P [1 ]
Segundo, SMA [1 ]
Klockow, D [1 ]
机构
[1] COPEL,LAB CENT ELECTROTECN & ELETRON,BR-80420 CURITIBA,PARANA,BRAZIL
关键词
FT-IR spectroscopy; trace gas analysis; sulphur hexafluoride decomposition; partial discharge;
D O I
暂无
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Compressed gaseous sulphur hexafluoride is commonly used as an insulating medium in high-voltage equipment. In the presence of traces of oxygen and moisture, SF6 can undergo decomposition under electrical stress. FT-IR-spectroscopic methods provide the possibility for a multicomponent trace gas analysis in the SF6-matrix with the option of on-line measurements. Decomposition compounds, produced by partial discharges, can be determined by multivariate spectral data analysis. Time-dependent concentration changes of the SF6 impurities in different infrared gas cells have been evaluated.
引用
收藏
页码:193 / 195
页数:3
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