Investigation of electrically stressed SF4 gas by using FT-IR spectroscopy

被引：0

作者：

Heise, HM ^{[1
]}

Janissek, PR ^{[1
]}

Kurte, R ^{[1
]}

Fischer, P ^{[1
]}

Segundo, SMA ^{[1
]}

Klockow, D ^{[1
]}

机构：

[1] COPEL,LAB CENT ELECTROTECN & ELETRON,BR-80420 CURITIBA,PARANA,BRAZIL

来源：

MIKROCHIMICA ACTA | 1997年

关键词：

FT-IR spectroscopy; trace gas analysis; sulphur hexafluoride decomposition; partial discharge;

D O I：

暂无

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Compressed gaseous sulphur hexafluoride is commonly used as an insulating medium in high-voltage equipment. In the presence of traces of oxygen and moisture, SF6 can undergo decomposition under electrical stress. FT-IR-spectroscopic methods provide the possibility for a multicomponent trace gas analysis in the SF6-matrix with the option of on-line measurements. Decomposition compounds, produced by partial discharges, can be determined by multivariate spectral data analysis. Time-dependent concentration changes of the SF6 impurities in different infrared gas cells have been evaluated.

引用

页码：193 / 195

页数：3

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