Evaluation of Measurement Resolution for Scanning Microwave Microscopy

被引:0
|
作者
Horibe, Masahiro [1 ]
Kon, Seitaro [1 ]
Hirano, Iku [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki, Japan
关键词
GaN epitaxial film; Graphene films; Si-dopant multi-later film and surface mount device (SMD); Interferometric circuit; Measurement uncertainty; Scanning microwave microscopy (SMM);
D O I
10.1109/arftg.2019.8637223
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Here we investigated the measurement resolution of a scanning microwave microscope (SMM) based on an atomic force microscope (A FM) for the characterization of several types of sample. Then, we proposed uncertainty/accuracy evaluation of SMM systems in laboratories. Dielectric material samples with high permittivity was able to be quantitatively evaluated by SMM measurement. The SMM has been detect the difference of permittivity with uncertainty. However, possibility of evaluation is now unknown for materials with small difference of electrical characteristics. This paper presents investigation results and consideration of SMM resolution by comparing with measurement uncertainty of vector network analyzers. Here, we show SARI measurement results with uncertainty for GaN epitaxial film, Graphene films, Si-dopant multi-later film and surface mount device (SMD). As the result, SMM has capable of quantitatively measuring SMD.
引用
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页数:7
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