Bulk growth of SiC - review on advances of SiC vapor growth for improved doping and systematic study on dislocation evolution

被引:21
|
作者
Sakwe, Sakwe Aloysius [1 ]
Stockmeier, Mathias [2 ]
Hens, Philip [1 ]
Mueller, Ralf [1 ]
Queren, Desiree [1 ]
Kunecke, Ulrike [1 ]
Konias, Katja [2 ]
Hock, Rainer [2 ]
Magerl, Andreas [2 ]
Pons, Michel [3 ]
Winnacker, Albrecht [1 ]
Wellmann, Peter [1 ]
机构
[1] Univ Erlangen Nurnberg, Inst Mat Sci 6, D-91058 Erlangen, Germany
[2] Univ Erlangen Nurnberg, Inst Crystallog & Struct Phys, D-91058 Erlangen, Germany
[3] Inst Natl Polytech Grenoble, F-38402 Grenoble, France
来源
关键词
D O I
10.1002/pssb.200743520
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The paper reviews research on advanced crystal growth of SiC. A brief review highlights the benefits of the so called Modified Physical Vapor Transport Technique which uses an additional gas pipe for fine tuning of the growth cell of a conventional Physical Vapor Transport setup with additional gases. Main emphasis, however, will be laid on a systematic dislocation evolution study for various growth parameter sets. Besides doping, growth temperature was considered. Two main results were found: (i) In p-type SiC, irrespective of the incorporation of aluminum or boron acceptors, basal plane dislocations that are harmful for bipolar power devices appear less pronounced or are even absent compared to n-type SiC. (ii) Growth at elevated seed temperature (i.e. 2300 degrees C and higher) is beneficial for low dislocation densities. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
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页码:1239 / 1256
页数:18
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