Quantitative phase-field modeling of nonisothermal solidification in dilute multicomponent alloys with arbitrary diffusivities

被引：65
|
作者：
Ohno, Munekazu [1 ]
机构：
[1] Hokkaido Univ, Fac Engn, Div Mat Sci & Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
来源：
PHYSICAL REVIEW E | 2012年 / 86卷 / 05期
关键词：
DENDRITIC GROWTH; INTERFACE; SIMULATION; ASYMPTOTICS; NUCLEATION; SELECTION;
D O I：
10.1103/PhysRevE.86.051603
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
A quantitative phase-field model is developed for simulating microstructural pattern formation in nonisothermal solidification in dilute multicomponent alloys with arbitrary thermal and solutal diffusivities. By performing the matched asymptotic analysis, it is shown that the present model with antitrapping current terms reproduces the free-boundary problem of interest in the thin-interface limit. Convergence of the simulation outcome with decreasing the interface thickness is demonstrated for nonisothermal free dendritic growth in binary alloys and isothermal and nonisothermal free dendritic growth in a ternary alloy.
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页数：15
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