Influence of N2 spinning atmosphere on electrical properties of Ba(Ti0.85Sn0.15)O3 ferroelectric thin films for dielectric bolometer mode infrared sensor applications
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作者:
Popovici, D.
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机构:Osaka Univ, Dept Syst Innovat, Grad Sch Engn Sci, Toyonaka, Osaka 560, Japan
Popovici, D.
Murakami, S.
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机构:Osaka Univ, Dept Syst Innovat, Grad Sch Engn Sci, Toyonaka, Osaka 560, Japan
Murakami, S.
Matsumoto, M.
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机构:Osaka Univ, Dept Syst Innovat, Grad Sch Engn Sci, Toyonaka, Osaka 560, Japan
Matsumoto, M.
Noda, M.
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机构:Osaka Univ, Dept Syst Innovat, Grad Sch Engn Sci, Toyonaka, Osaka 560, Japan
Noda, M.
Okuyama, M.
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机构:Osaka Univ, Dept Syst Innovat, Grad Sch Engn Sci, Toyonaka, Osaka 560, Japan
Okuyama, M.
机构:
[1] Osaka Univ, Dept Syst Innovat, Grad Sch Engn Sci, Toyonaka, Osaka 560, Japan
[2] Technol Res Inst Osaka Prefecture, Osaka, Japan
Ba(Ti1-xSnx)O-3;
metal-organic decomposition (MOD);
temperature coefficient of dielectric constant (TCD);
D O I:
10.1080/10584580600657724
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Polycrystalline Ba(Ti0.85Sn0.15)O-3 (BTS15) thin films have been prepared on Pt/Ti/SiO2/Si wafers by Metal-Organic Decomposition (MOD) process. Spin-coating was performed in N-2 atmosphere using different gas flow rates from 0 to 5 l/min while keeping the other fabrication steps the same. The influence of N-2 gas during the spin-coating was investigated. Investigations using XRD and AFM revealed that nitrogen gas flow plays an important role in obtaining films with a good crystallinity and a good grain size/RMS roughness ratio. Also, XPS and UV-PYS investigations revealed that, for the samples obtained when using 4 l/min N-2 flow during spinning, the concentration of oxygen vacancies has the smallest value among the investigated samples. The BTS samples with nitrogen flow rate of 4 l/min have the highest polarization and the smallest leakage current among the investigated samples. Changes in electrical properties were explained considering the fact that the grain size and the roughness of the sample are affected by the different nitrogen flow rate and that the oxygen vacancy concentration is also influenced by the N-2 gas flow. Temperature Coefficient of Dielectric constant (TCD), a parameter of infrared sensitivity, becomes more than 1%/K for a large temperature range when the N-2 flow rate was 4 l/min, making this film suitable for infrared sensing applications.
机构:
Cent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Ma, Jiafeng
Liu, Xinyu
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Cent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Guilin Univ Elect Technol, Guangxi Key Lab Informat Mat, Guilin 541004, Guangxi, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Liu, Xinyu
Jiang, Minhong
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Guilin Univ Elect Technol, Guangxi Key Lab Informat Mat, Guilin 541004, Guangxi, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Jiang, Minhong
Yang, Huabin
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机构:
Cent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Guilin Univ Elect Technol, Guangxi Key Lab Informat Mat, Guilin 541004, Guangxi, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Yang, Huabin
Chen, Guohua
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Guilin Univ Elect Technol, Guangxi Key Lab Informat Mat, Guilin 541004, Guangxi, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Chen, Guohua
Liu, Xiao
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Guilin Univ Elect Technol, Guangxi Key Lab Informat Mat, Guilin 541004, Guangxi, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Liu, Xiao
Qin, Liangning
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机构:
Guilin Univ Elect Technol, Guangxi Key Lab Informat Mat, Guilin 541004, Guangxi, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
Qin, Liangning
Luo, Cheng
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Guilin Univ Elect Technol, Guangxi Key Lab Informat Mat, Guilin 541004, Guangxi, Peoples R ChinaCent S Univ, Coll Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
机构:
Chiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, ThailandChiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, Thailand
Tawichai, Nattaya
Tunkasiri, Tawee
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机构:
Chiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, Thailand
Chiang Mai Univ, Sci & Technol Res Inst, Chiang Mai 50200, Thailand
Mae Fah Luang Univ, Sch Sci, Chiang Rai 57100, ThailandChiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, Thailand
Tunkasiri, Tawee
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Pengpat, Kamonpan
Eitssayeam, Sukum
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Chiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, Thailand
Chiang Mai Univ, Sci & Technol Res Inst, Chiang Mai 50200, ThailandChiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, Thailand
Eitssayeam, Sukum
Rujijanagul, Gobwute
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Chiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, Thailand
Chiang Mai Univ, Sci & Technol Res Inst, Chiang Mai 50200, ThailandChiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai 50200, Thailand
机构:Chinese Academy of Sciences,Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics & Chemistry
Shihua Yang
JinBao Xu
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机构:Chinese Academy of Sciences,Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics & Chemistry
JinBao Xu
Bo Gao
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机构:Chinese Academy of Sciences,Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics & Chemistry
Bo Gao
Lei Wang
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机构:Chinese Academy of Sciences,Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics & Chemistry
Lei Wang
Jing Chen
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机构:Chinese Academy of Sciences,Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics & Chemistry
Jing Chen
Xueying Chen
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机构:Chinese Academy of Sciences,Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics & Chemistry
Xueying Chen
Journal of Materials Science: Materials in Electronics,
2013,
24
: 658
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661