New AFM imaging for high aspect structures: STI and contact holes

被引：0
|
作者：
Morimoto, T [1 ]
Kuroda, H [1 ]
Minomoto, Y [1 ]
Nagano, Y [1 ]
Kembo, Y [1 ]
Hosaka, S [1 ]
机构：
[1] Hitachi Kenki FineTech Co Ltd, Ibaraki 3000013, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS | 2001年
关键词：
D O I：
10.1109/IMNC.2001.984181
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：244 / 245
页数：2
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