Role of native point defects and Ga diffusion on electrical properties of degenerate Ga-doped ZnO

被引:4
|
作者
Doutt, Daniel R. [1 ]
Balaz, S. [2 ]
Isabella, L. [1 ]
Look, D. C. [3 ,4 ]
Leedy, K. D. [5 ]
Brillson, L. J. [1 ,2 ]
机构
[1] Ohio State Univ, Dept Phys, Columbus, OH 43210 USA
[2] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[3] Wright State Univ, Semicond Res Ctr, Dayton, OH 45433 USA
[4] Wile Labs Inc, Dayton, OH 45431 USA
[5] Air Force Res Lab, Wright Patterson AFB, OH 45433 USA
来源
基金
美国国家科学基金会;
关键词
defect; doping; TCO; ZnO;
D O I
10.1002/pssb.201200945
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We used a complement of depth-resolved cathodoluminescence spectroscopy (DRCLS), X-ray photoemission spectroscopy (XPS), and Hall-effect measurements to demonstrate the interplay of Zn vacancy-related (V-Zn-R) defects with dopants in degenerately Ga-doped ZnO grown by pulsed laser deposition. DRCLS V-Zn-R/conduction band emission ratios relate to acceptor/donor concentrations, increasing rapidly for growth temperatures >400 degrees C, evidently because Ga atoms are inhibited from incorporating efficiently on available V-Zn sites. Elemental XPS depth profiles reveal a temperature-dependent Ga interface segregation due to Ga bulk diffusion during growth. DRCLS Fermi level thresholds provide a useful indicator of carrier density, revealing depth variations in carrier density that anticorrelate with V-Zn-R densities on a nm scale, confirming the acceptor nature of V-Zn-R defects. (C) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:2114 / 2117
页数:4
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