A Switched Gain Resonant Controller to Minimize Image Artifacts in Intermittent Contact Mode Atomic Force Microscopy

被引:7
|
作者
Fairbairn, Matthew W. [1 ]
Moheimani, S. O. Reza [1 ]
机构
[1] Univ Newcastle, Sch Elect Engn & Comp Sci, Callaghan, NSW 2308, Australia
基金
澳大利亚研究理事会;
关键词
Atomic Force Microscopy; field-programmable analog array (FPAA); quality factor control; resonant control; FLEXIBLE STRUCTURES; FEEDBACK-CONTROL; SPEED; RESOLUTION; SYSTEMS;
D O I
10.1109/TNANO.2012.2216288
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As the scan speed of the atomic force microscope (AFM) operating in intermittent contact mode is increased, the likelihood of artifacts appearing in the image is increased due to the probe tip losing contact with the sample. This paper presents an analysis of the effects of probe loss and a new method, switched gain resonant control, of reducing the problem of probe loss when imaging at high speed. The switched gain resonant controller is implemented to switch the cantilever quality Q factor according to the sample profile during the scan. If the controller detects that the probe has lost contact with the sample the cantilever Q factor is increased leading to a faster response of the feedback controller, expediting the resumption of contact. A significant reduction in image artifacts due to probe loss is observed when this control technique is employed at high scan speeds.
引用
下载
收藏
页码:1126 / 1134
页数:9
相关论文
共 50 条
  • [41] Optical Sensing Limits in Contact and Bending Mode Atomic Force Microscopy
    T. W. Ng
    S. Thirunavukkarasu
    Experimental Mechanics, 2007, 47 : 841 - 844
  • [42] Surface roughness by contact versus tapping mode atomic force microscopy
    Simpson, GJ
    Sedin, DL
    Rowlen, KL
    LANGMUIR, 1999, 15 (04) : 1429 - 1434
  • [43] Nanomechanical measurements on polymers using contact mode atomic force microscopy
    Lemoine, P
    McLaughlin, JM
    THIN SOLID FILMS, 1999, 339 (1-2) : 258 - 264
  • [44] Manipulation of carbon nanotube bundles with contact mode atomic force microscopy
    Shen, Ziyong
    Liu, Saijin
    Hou, Shimin
    Xue, Zengquan
    International Journal of Nanoscience, Vol 1, Nos 5 and 6, 2002, 1 (5-6): : 575 - 579
  • [45] Velocity dependent friction laws in contact mode atomic force microscopy
    Stark, RW
    Schitter, G
    Stemmer, A
    ULTRAMICROSCOPY, 2004, 100 (3-4) : 309 - 317
  • [46] Analysis of PI-Control for Atomic Force Microscopy in Contact Mode
    Messineo, Saverio
    Ragazzon, Michael R. P.
    Busnelli, Fabio
    Gravdahl, Jan Tommy
    IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY, 2022, 30 (04) : 1681 - 1695
  • [47] Dual resonance excitation system for the contact mode of atomic force microscopy
    Kopycinska-Mueller, M.
    Striegler, A.
    Schlegel, R.
    Kuzeyeva, N.
    Koehler, B.
    Wolter, K. -J.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2012, 83 (04):
  • [48] High-resolution nanophotolithography in atomic force microscopy contact mode
    Gilbert, Y
    Fikri, R
    Ruymantseva, A
    Lerondel, G
    Bachelot, R
    Barchiesi, D
    Royer, P
    MACROMOLECULES, 2004, 37 (10) : 3780 - 3791
  • [49] Wide range local resistance imaging on fragile materials by conducting probe atomic force microscopy in intermittent contact mode
    Vecchiola, Aymeric
    Chretien, Pascal
    Delprat, Sophie
    Bouzehouane, Karim
    Schneegans, Olivier
    Seneor, Pierre
    Mattana, Richard
    Tatay, Sergio
    Geffroy, Bernard
    Bonnassieux, Yvan
    Mencaraglia, Denis
    Houze, Frederic
    APPLIED PHYSICS LETTERS, 2016, 108 (24)
  • [50] Optical sensing limits in contact and bending mode atomic force microscopy
    Ng, T. W.
    Thirunavukkarasu, S.
    EXPERIMENTAL MECHANICS, 2007, 47 (06) : 841 - 844