Mass-produced multi-walled carbon nanotubes (MWNTs, which have the trademark VGNF (R)) have been investigated for their potential for use in electric double-layer capacitors (EDLCs). The variation aspects of these MWNTs by KOH activation showed quite interesting features. The gravimetric capacitance enhancement and specific surface area on KOH activation increased linearly. However, the capacitance per unit surface area has a maximum at 200 wt. % of KOH addition. The VGNF-KOH 500 sample exhibits a capacitance enhancement as much as 13 times greater (28.3 F/g) than that of the as-grown materials (2.2 F/g), under the conditions of charging up to 3.5 V and discharging at a current density of 10 mA/cm(2). Interestingly, for this MWNT (VGNF (R)), selective attack on its amorphous carbon impurity has also been observed, as demonstrated from both scanning electron microscopy observations and Raman spectra. Consequently, the results of this study will provide insight into the potentiality of using MWNTs for EDLC electrodes, which would enable the cheapest production cost among the various types of carbon nanotubes.
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Nagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, JapanNagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, Japan
Inoue, Tsuyoshi
Matsushita, Tomohiro
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Nagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, JapanNagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, Japan
Matsushita, Tomohiro
Ishii, Yosuke
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Nagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, JapanNagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, Japan
Ishii, Yosuke
Kawasaki, Shinji
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Nagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, JapanNagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, Japan
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Toyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, Japan
Yoneda, Daisuke
Suzuki, Seiya
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Toyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, Japan
Suzuki, Seiya
Hiramoto, Satoshi
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Toyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, Japan
Hiramoto, Satoshi
Matsuoka, Yuki
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Toyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, Japan
Matsuoka, Yuki
Hara, Masanori
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Toyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, Japan
Hara, Masanori
Yoshimura, Masamichi
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Toyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, JapanToyota Technol Inst, Grad Sch Engn, Tempaku Ku, 2-12-1 Hisakata, Nagoya, Aichi 4688511, Japan
机构:Department of Electrical and Computer Engineering Center for Electronic and Electro-optic Materials, State University of New York at Buffalo, Amherst, 14260, NY, Bonner Hall
SHI, ZQ
JIA, QX
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机构:Department of Electrical and Computer Engineering Center for Electronic and Electro-optic Materials, State University of New York at Buffalo, Amherst, 14260, NY, Bonner Hall
JIA, QX
ANDERSON, WA
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机构:Department of Electrical and Computer Engineering Center for Electronic and Electro-optic Materials, State University of New York at Buffalo, Amherst, 14260, NY, Bonner Hall