Defect detection methodology on the back-end process: A case of study

被引：1
|
作者：
Martin, H [1 ]
Bichebois, P [1 ]
机构：
[1] CTR COMMUN CNET SGS THOMSON,F-38920 CROLLES,FRANCE
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X | 1996年 / 2725卷
关键词：
laser scattering; optical bright-field; inspection; review; optical dark-field; electrical yield prediction; W selective process; optical microscope; AFM analysis; SEM analysis; size correlation;
D O I：
10.1117/12.240087
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：233 / 241
页数：9
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