Self-assembled 1-octadecyl-1H-1,2,4-triazole films on copper for corrosion protection

被引:15
|
作者
Rao, B. V. Appa [1 ]
Reddy, M. Narsihma [1 ]
Sreedhar, B. [2 ]
机构
[1] Natl Inst Technol Warangal, Dept Chem, Warangal 506004, Andhra Pradesh, India
[2] Indian Inst Chem Technol, Inorgan & Phys Chem Div, Hyderabad 500007, Andhra Pradesh, India
关键词
Copper; 1,2,4-Triazole; Self-assembly; Electrochemical impedance spectroscopy; XPS; CHLORIDE MEDIA; MONOLAYERS; INHIBITION; DEPOSITION; OXIDATION; ABILITY;
D O I
10.1016/j.porgcoat.2013.09.009
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
A film of 1-octadecyl-1H-1,2,4-triazole (OTA) was formed on a fresh copper surface by self-assembly technique. The optimum concentration of OTA and immersion time for the formation of a protective OTA film have been established using electrochemical impedance spectroscopy (EIS). These are (i) 15 mM concentration of OTA in methanol and (ii) immersion period of 48 h. X-ray photoelectron spectroscopy (XPS), reflection absorption FTIR spectroscopy, atomic force microscopy (AFM), and contact angle measurements have been used to characterize the OTA film on copper surface. The efficiency of OTA film to protect copper from corrosion in aqueous NaCl environment has been investigated using EIS, potentio-dynamic polarization studies, cyclic voltammetry and weight-loss studies. All these studies showed that the OTA film affords excellent protection against corrosion of copper. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:202 / 212
页数:11
相关论文
共 50 条
  • [41] A study on flash pyrolysis of 1H-1,2,4-triazole
    Kumasaki, M.
    Wada, Y.
    Akutsu, Y.
    Arai, M.
    Tamura, M.
    Kayaku Gakkaishi/Journal of the Japan Explosives Society, 2001, 62 (03): : 147 - 152
  • [42] Effect of 1,2,4-triazole on galvanic corrosion between cobalt and copper in CMP based alkaline slurry
    Lei Fu
    Yuling Liu
    Chenwei Wang
    Linan Han
    Journal of Semiconductors, 2018, 39 (04) : 81 - 86
  • [43] Effect of 1,2,4-triazole on galvanic corrosion between cobalt and copper in CMP based alkaline slurry
    Lei Fu
    Yuling Liu
    Chenwei Wang
    Linan Han
    Journal of Semiconductors, 2018, (04) : 81 - 86
  • [44] Effect of 1,2,4-triazole on galvanic corrosion between cobalt and copper in CMP based alkaline slurry
    Fu, Lei
    Liu, Yuling
    Wang, Chenwei
    Han, Linan
    JOURNAL OF SEMICONDUCTORS, 2018, 39 (04)
  • [45] SYNTHESIS OF 1-SUBSTITUTED 1H-1,2,4-TRIAZOLE DERIVATIVES
    Yan Nian SHI
    Yang YANG
    Jian Xin FANG and Wen Shuo LU (Inst. of Elemento-Organic Chem.
    Chinese Chemical Letters, 1996, (05) : 407 - 410
  • [46] 1-methyl-3,5-diphenyl-1H-1,2,4-triazole
    Yazici, S
    Isik, S
    Agar, E
    Karaoglu, SA
    Bekircan, O
    Kolayli, S
    Senel, I
    Büyükgüngör, O
    ACTA CRYSTALLOGRAPHICA SECTION E-STRUCTURE REPORTS ONLINE, 2004, 60 : O815 - O816
  • [47] Mechanism of 1,2,4-Triazole during Copper Chemical Mechanical Planarization
    Li J.
    He Q.
    Wang T.
    Mocaxue Xuebao/Tribology, 2017, 37 (03): : 333 - 339
  • [48] 1-(4-Nitrophenoxymethyl)-1H-1,2,4-triazole
    Li, Jian
    ACTA CRYSTALLOGRAPHICA SECTION E-STRUCTURE REPORTS ONLINE, 2008, 64 : O17 - U2633
  • [49] Passivation Kinetics of 1,2,4-Triazole in Copper Chemical Mechanical Polishing
    Jiang, Liang
    He, Yongyong
    Li, Jing
    Luo, Jianbin
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2016, 5 (05) : P272 - P279
  • [50] Synthesis of 1-substituted 1H-1,2,4-triazole derivatives
    Shi, YN
    Yang, Y
    Fang, JX
    Lu, WS
    CHINESE CHEMICAL LETTERS, 1996, 7 (05) : 407 - 410