Extreme ultraviolet lithography: Will it be ready in time?

被引:0
|
作者
Hutcheson, GD
机构
关键词
D O I
10.1109/MSPEC.2001.963237
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
[No abstract available]
引用
收藏
页码:15 / 16
页数:2
相关论文
共 50 条
  • [1] Extreme ultraviolet lithography
    Stulen, RH
    Sweeney, DW
    [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1999, 35 (05) : 694 - 699
  • [2] EXTREME ULTRAVIOLET LITHOGRAPHY
    Cummings, Kevin
    Suzuki, Kazuaki
    [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 8 (04):
  • [3] Extreme ultraviolet lithography
    Gwyn, CW
    Stulen, R
    Sweeney, D
    Attwood, D
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3142 - 3149
  • [4] Extreme ultraviolet lithography
    Sandia Natl Lab, Livermore, United States
    [J]. Opt Photonics News, 8 (35-38):
  • [5] Estimation of extreme ultraviolet power and throughput for extreme ultraviolet lithography
    Chiba, A.
    Ota, K.
    Ogawa, T.
    Okazaki, S.
    [J]. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (07): : 4535 - 4539
  • [6] Estimation of extreme ultraviolet power and throughput for extreme ultraviolet lithography
    Chiba, A
    Ota, K
    Ogawa, T
    Okazaki, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (07): : 4535 - 4539
  • [7] More on extreme ultraviolet lithography
    不详
    [J]. MATERIALS WORLD, 2008, 16 (05) : 9 - 9
  • [8] Masks for extreme ultraviolet lithography
    Vernon, SP
    Kearney, PA
    Tong, WM
    Prisbrey, S
    Larson, C
    Moore, CE
    Weber, FW
    Cardinale, G
    Yan, PY
    Hector, SD
    [J]. 18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3546 : 184 - 193
  • [9] Maskless extreme ultraviolet lithography
    [J]. J Vac Sci Technol B Microelectron Nanometer Struct, (3047-3051):
  • [10] Photoresist for Extreme Ultraviolet Lithography
    Tao, Peipei
    Sheng, Li
    Wang, Qianqian
    Cui, Hao
    Wang, Xiaolin
    He, Xiangming
    Xu, Hong
    [J]. IWAPS 2020: PROCEEDINGS OF 2020 4TH INTERNATIONAL WORKSHOP ON ADVANCED PATTERNING SOLUTIONS (IWAPS), 2020, : 53 - 56