Epitaxy and characterization of GaInP/AlInP light-emitting diodes on As-doped Ge/Si substrates

被引:3
|
作者
Wang, Cong [1 ]
Wang, Bing [2 ]
Lee, Kwang Hong [2 ]
Tan, Chuan Seng [1 ,2 ]
Yoon, Soon Fatt [1 ,2 ]
Michel, Jurgen [2 ,3 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, 50 Nanyang Ave, Singapore 639798, Singapore
[2] Singapore MIT Alliance Res & Technol SMART, LEES, 1 CREATE Way,10-01 CREATE Tower, Singapore 138602, Singapore
[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
来源
OPTICS EXPRESS | 2016年 / 24卷 / 20期
基金
新加坡国家研究基金会;
关键词
SI; GE;
D O I
10.1364/OE.24.023129
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We investigate the impact of threading dislocation density (TDD) and thermal conductivity of substrates on the performance of GaInP/AlInP light-emitting diodes (LEDs) for the integration of III-V optoelectronics on Si. We utilized an arsenic (As) doped Ge/Si substrate that showed a reduced TDD compared to undoped Ge/Si. Compared to LEDs on undoped Ge/Si, the leakage current density for LEDs on As-doped Ge/Si substrate is reduced by four orders of magnitude and the light output is increased six-fold. An increased junction temperature causes light output saturation for LEDs on bulk Ge at high injection current densities. The light output of LEDs on As-doped Ge/Si shows good linearity with injection current density and its junction temperature is similar to 25 +/- 5 degrees C lower than that of LEDs on bulk Ge at high injection current densities due to better thermal conductivity of the Ge/Si substrate. (C) 2016 Optical Society of America
引用
收藏
页码:23129 / 23135
页数:7
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