ZnO light-emitting diodes fabricated on Si substrates with homobuffer layers ZnO light-emitting diodes fabricated on Si substrates with homobuffer layers

被引:61
|
作者
Ye, Z. Z. [1 ]
Lu, J. G. [1 ]
Zhang, Y. Z. [1 ]
Zeng, Y. J. [1 ]
Chen, L. L. [1 ]
Zhuge, F. [1 ]
Yuan, G. D. [1 ]
He, H. P. [1 ]
Zhu, L. P. [1 ]
Huang, J. Y. [1 ]
Zhao, B. H. [1 ]
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
关键词
D O I
10.1063/1.2783262
中图分类号
O59 [应用物理学];
学科分类号
摘要
ZnO homojunction light-emitting diodes (LEDs), comprised of N-Al codoped p-type ZnO and Al-doped n-type ZnO layers, were fabricated on Si substrates with homobuffer layers. The current-voltage measurements showed typical diode characteristic with a threshold voltage of about 3.3 V. The electroluminescence (EL) bands at 110 K consisted of a near-band-edge emission at 3.18 eV and a deep level emission at 2.58 eV. The EL emissions were assigned as radiative recombinations, presumably of donor-acceptor pairs, in the p-type layer of the LED. The quenching of EL with temperature was attributed to the degradation of p-type conducting of the ZnO:(N,Al) layer.
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页数:3
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