Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering

被引：20
|
作者：
Martinez-Martinez, D. [1 ]
Lopez-Cartes, C. [1 ]
Fernandez, A. [1 ]
Sanchez-Lopez, J. C. [1 ]
机构：
[1] Univ Seville, CSIC, Ctr Mixto, Inst Ciencia Mat Sevilla, Seville 41092, Spain
来源：
APPLIED SURFACE SCIENCE | 2013年 / 275卷
关键词：
TiN; Target; Magnetron sputtering; XRD; Stress; Hardness; TITANIUM NITRIDE; NANOCOMPOSITE COATINGS; OPTICAL-PROPERTIES; ION-BOMBARDMENT; CARBIDE; GROWTH; XPS; MICROSTRUCTURE; SPECTROSCOPY; TEMPERATURE;
D O I：
10.1016/j.apsusc.2013.01.098
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N-2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a -100 V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wear-resistant TiN films. (c) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：121 / 126
页数：6
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