A negative-working alkaline developable photoresist based on calix[4]resorcinarenes, a cross-linker, and a photoacid generator.

被引：0
|
作者：
Ueda, M [1 ]
Takahashi, D [1 ]
Nakayama, T [1 ]
Haba, O [1 ]
机构：
[1] YAMAGATA UNIV,GRAD SCH ENGN,DEPT HUMAN SENSING & FUNCT SENSOR ENGN,YONEZAWA,YAMAGATA 992,JAPAN
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 214卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：279 / PMSE
页数：1
相关论文
共 29 条
  • [1] A negative-working alkaline developable photoresist based on calix[4]resorcinarene, a cross-linker, and a photoacid generator
    Nakayama, T
    Haga, K
    Haba, O
    Ueda, M
    CHEMISTRY LETTERS, 1997, (03) : 265 - 266
  • [2] Three-component negative-type photoresist based on C-tetraoctyl-calix[4]resorcinarene, a cross-linker, and a photoacid generator.
    Takeshi, K
    Takahashi, D
    Nakayama, T
    Ueda, M
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U659 - U659
  • [3] Three-component negative-type photoresist based on calix[4]resorcinarene, a cross-linker, and a photoacid generator
    Ueda, M
    Takahashi, D
    Nakayama, T
    Haba, O
    CHEMISTRY OF MATERIALS, 1998, 10 (08) : 2230 - 2234
  • [4] A positive-working alkaline developable photoresist based on t-BOC-calix[4]resorcinarene and a photoacid generator
    Takeshi, K
    Nakayama, R
    Ueda, M
    CHEMISTRY LETTERS, 1998, (09) : 865 - 866
  • [5] A positive-working alkaline developable photoresist based on partially tert-Boc-protected calix[4]resorcinarene and a photoacid generator
    Young-Gil, K
    Kim, JB
    Fujigaya, T
    Shibasaki, Y
    Ueda, M
    JOURNAL OF MATERIALS CHEMISTRY, 2002, 12 (01) : 53 - 57
  • [6] An Alkaline-Developable, Negative-Working Photosensitive Polybenzoxazole Based on Poly(o-hydroxyamide), a Vinyl Sulfone-Type Cross-Linker, and a Novel Photobase Generator
    Mizoguchi, Katsuhisa
    Higashihara, Tomoya
    Ueda, Mitsuru
    MACROMOLECULES, 2009, 42 (11) : 3780 - 3787
  • [7] Negative-Working Photosensitive Poly(phenylene ether) Based on Poly(2,6-dimethyl-1,4-phenylene ether), a Cross-Linker, and a Photoacid Generator
    Mizoguchi, Katsuhisa
    Higashihara, Tomoya
    Ueda, Mitsuru
    MACROMOLECULES, 2010, 43 (06) : 2832 - 2839
  • [8] New negative type photosensitive polyimide based on poly(hydroxyimide), cross-linker, and photacid generator.
    Ueda, M
    Nakayama, T
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1996, 211 : 18 - POLY
  • [9] A new three-component photoresist based on calix[4]resorcinarene derivative, a cross-linker, and a photo-acid generator
    Nakayama, T
    Nomura, M
    Haga, K
    Ueda, M
    BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1998, 71 (12) : 2979 - 2984
  • [10] A new negative-type photosensitive polyimide based on poly(hydroxyimide), a cross-linker, and a photoacid generator
    Ueda, M
    Nakayama, T
    MACROMOLECULES, 1996, 29 (20) : 6427 - 6431
123