Biological organisms exist over a broad temperature range of 15 degrees C to +120 degrees C, where many molecular processes involving DNA depend on the nanoscale properties of the double helix. Here, we present results of extensive molecular dynamics simulations of DNA oligomers at different temperatures. We show that internal basepair conformations are strongly temperature-dependent, particularly in the stretch and opening degrees of freedom whose harmonic fluctuations can be considered the initial steps of the DNA melting pathway. The basepair step elasticity contains a weaker, but detectable, entropic contribution in the roll, tilt, and rise degrees of freedom. To extend the validity of our results to the temperature interval beyond the standard melting transition relevant to extremophiles, we estimate the effects of superhelical stress on the stability of the basepair steps, as computed from the Benham model. We predict that although the average twist decreases with temperature in vitro, the stabilizing external torque in vivo results in an increase of 1 degrees/bp (or a superhelical density of Delta sigma-=0.03) in the interval 0-100 degrees C. In the final step, we show that the experimentally observed apparent bending persistence length of torsionally unconstrained DNA can be calculated from a hybrid model that accounts for the softening of the double helix and the presence of transient denaturation bubbles. Although the latter dominate the behavior close to the melting transition, the inclusion of helix softening is important around standard physiological temperatures.
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UCL, London Ctr Nanotechnol, London WC1H 0AH, EnglandUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Leung, Carl
Bestembayeva, Aizhan
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UCL, London Ctr Nanotechnol, London WC1H 0AH, England
UCL, Dept Phys & Astron, London WC1E 6BT, EnglandUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Bestembayeva, Aizhan
Thorogate, Richard
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UCL, London Ctr Nanotechnol, London WC1H 0AH, EnglandUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Thorogate, Richard
Stinson, Jake
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UCL, London Ctr Nanotechnol, London WC1H 0AH, England
UCL, Dept Phys & Astron, London WC1E 6BT, EnglandUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Stinson, Jake
Pyne, Alice
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UCL, London Ctr Nanotechnol, London WC1H 0AH, England
Natl Phys Lab, Teddington TW11 0LW, Middx, EnglandUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Pyne, Alice
Marcovich, Christian
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UCL, London Ctr Nanotechnol, London WC1H 0AH, England
Ecole Polytech, F-91128 Palaiseau, FranceUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Marcovich, Christian
Yang, Jinling
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Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R ChinaUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Yang, Jinling
Drechsler, Ute
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IBM Corp, Div Res, Zurich Res Lab, CH-8803 Ruschlikon, SwitzerlandUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Drechsler, Ute
Despont, Michel
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IBM Corp, Div Res, Zurich Res Lab, CH-8803 Ruschlikon, SwitzerlandUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Despont, Michel
Jankowski, Tilo
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JPK Instruments AG, D-12435 Berlin, GermanyUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Jankowski, Tilo
Tschoepe, Martin
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JPK Instruments AG, D-12435 Berlin, GermanyUCL, London Ctr Nanotechnol, London WC1H 0AH, England
Tschoepe, Martin
Hoogenboom, Bart W.
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UCL, London Ctr Nanotechnol, London WC1H 0AH, England
UCL, Dept Phys & Astron, London WC1E 6BT, EnglandUCL, London Ctr Nanotechnol, London WC1H 0AH, England