Computer simulation of optoelectronic behavior in image materials

被引：0
|
作者：
Li, XW [1 ]
Sun, YC [1 ]
Fu, GS [1 ]
Zhang, LS [1 ]
Han, L [1 ]
机构：
[1] Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Peoples R China
来源：
SEMICONDUCTOR OPTOELECTRONIC DEVICE MANUFACTURING AND APPLICATIONS | 2001年 / 4602卷
关键词：
computer simulation; optoelectronic behavior; image material;
D O I：
10.1117/12.445751
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Silver halide emulsion is an important component of image materials. It can develop permanent image through the absorption of light. It is widely used in many kinds of fields and has a very prosperous prospect. Now many scientists study the properties of image material, but they mainly focus on experimental methods. Computer simulation method opens up a brand-new way in the study of optoelectronic behavior in image materials. Compared with traditional experimental ways, this method is more economical and convenient and has a shorter research period. So it is a very practical method to exploit new type of image materials and perfect photosensitive theory. In this paper, Nucleation & Growth model and Monte Carlo method were adopted to simulate the optoelectronic behavior in image materials and results with different input parameters will be given.
引用
收藏
页码：334 / 338
页数：5
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