Atomic force microscopy probes with integrated boron doped diamond electrodes: Fabrication and application

被引：17
|
作者：
Eifert, Alexander [1 ]
Smirnov, Waldemar [2 ]
Frittmann, Stefan [1 ]
Nebel, Christoph [2 ]
Mizaikoff, Boris [1 ]
Kranz, Christine [1 ]
机构：
[1] Univ Ulm, Inst Analyt & Bioanalyt Chem, D-89081 Ulm, Germany
[2] Fraunhofer Inst Appl Solid State Phys, Freiburg, Germany
来源：
ELECTROCHEMISTRY COMMUNICATIONS | 2012年 / 25卷
关键词：
Boron-doped diamond electrode; Combined atomic force-scanning electrochemical microscopy; AFM tip-integrated electrode; SCANNING ELECTROCHEMICAL MICROSCOPY; DEPOSITION; BEHAVIOR;
D O I：
10.1016/j.elecom.2012.09.011
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
We report on the fabrication and characterization of atomic force microscopy (AFM) probes with integrated boron-doped diamond (BDD) electrodes. Silicon AFM probes were overgrown with boron-doped diamond and hydrogen-terminated during the plasma enhanced chemical vapor deposition (PECVD) process. As surface termination plays a significant role in the electrochemical behavior of BDD-electrodes, electrochemical surface treatment after FIB milling was performed to recover the surface properties of boron-doped diamond. Simulation of diffusion profiles towards the integrated electrode, as well as simultaneous topography and current imaging with the AFM tip-integrated boron-doped diamond electrode are demonstrated. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码：30 / 34
页数：5
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