共 15 条
- [1] The influence of heavily doped buried layer implants on electrostatic discharge (ESD), latchup, and a silicon germanium heterojunction bipolar transistor in a BiCMOS SiGE technology 2004 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS, 2004, : 143 - 151
- [3] The influence of process and design of subcollectors on the ESD robustness of ESD structures and silicon germanium heterojunction bipolar transistors in a BiCMOS SiGe technology 41ST ANNUAL PROCEEDINGS: INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, 2003, : 347 - 356
- [5] Research on Mextram Model of Germanium Silicon Heterojunction Bipolar Transistor with RF Avalanche Effect Tien Tzu Hsueh Pao/Acta Electronica Sinica, 2023, 51 (06): : 1493 - 1499
- [6] RF power characteristics of SiGe heterojunction bipolar transistor with high breakdown voltage structures 2002 IEEE RADIO FREQUENCY INTEGRATED CIRCUITS (RFIC) SYMPOSIUM, DIGEST OF PAPERS, 2002, : 377 - 379
- [7] RF power characteristics of SiGe Heterojunction Bipolar Transistor with high Breakdown voltage structures 2002 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-3, 2002, : 293 - 295
- [9] Electrostatic discharge characterization of epitaxial-base silicon-germanium heterojunction bipolar transistors ELECTRICAL OVERSTRESS/ELECTROSTATIC DISCHARGE SYMPOSIUM PROCEEDINGS, 2000, 2000, : 239 - 250