Design of photoresist based on diverse reaction of polyfunctional vinyl ether monomers.

被引：0
|
作者：
Yamaoka, T [1 ]
Takahara, S [1 ]
Miyagawa, N [1 ]
机构：
[1] Chiba Univ, Dept Informat & Image Sci, Chiba, Japan
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1999年 / 218卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
70-PMSE
引用
收藏
页码：U623 / U623
页数：1
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