A polishing method for single crystal diamond (100) plane based on nano silica and nano nickel powder

被引：18

作者：

Cui, Zhipeng ^{[1
]}

Li, Guo ^{[2
]}

Zong, Wenjun ^{[1
]}

机构：

[1] Harbin Inst Technol, Ctr Precis Engn, Harbin 150001, Heilongjiang, Peoples R China

[2] China Acad Engn Phys, Laser Fus Res Ctr, Mianyang 621900, Sichuan, Peoples R China

来源：

关键词：

Single crystal diamond; Polishing; Nano nickel; Roughness; CVD DIAMOND; TOOL;

D O I：

10.1016/j.diamond.2019.04.016

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Single crystal diamond is widely used in the manufacturing of diamond cutting tools. In this work, the diamond (100) plane which is always orientated as the rake face of diamond cutting tools is polished by using a polishing pad covered with nano silica and nickel powder. The results show that the polishing with nano nickel powder can achieved the satisfactory surface quality in a defined polishing time of 140 min, in which the surface roughness of the polished diamond (100) plane reaches to 0.25 nm Ra and 2.30 nm PV in a scanning area of 50 x 50 mu m(2). Raman spectra analysis further reveals that graphitization or amorphization occurs on the diamond surface during polishing with nickel powder. Finally, based on the polishing method with nano nickel powder, the influence of the polishing parameters on the achieved surface quality is investigated so as to optimize the polishing parameters.

引用

页码：141 / 153

页数：13

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